Lenhart, J.
, Fischer, D.
, Sambasivan, S.
, Lin, E.
, Wu, W.
, Guerrero, D.
, Wang, Y.
and Puligadda, R.
(2021),
Understanding Deviations in Lithographic Patterns Near Interfaces: Characterization of Antireflective Coatings (ARC) and the ARC/Resist Interface, Applied Surface Science
(Accessed December 8, 2024)