@article{783101,
  author = {Joseph~undefined~undefined~undefined~undefined~undefined Lenhart and Daniel Fischer and S Sambasivan and Eric Lin and Wen-Li Wu and Douglas Guerrero and Yijun Wang and R Puligadda},
  title = {Understanding Deviations in Lithographic Patterns Near Interfaces: Characterization of Antireflective Coatings (ARC) and the ARC/Resist Interface},
  year = {2021},
  month = {2021-10-12 15:10:24},
  publisher = {Applied Surface Science},
  language = {en},
}