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Search Publications by: Ulf Griesmann (Fed)

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Displaying 26 - 50 of 70

Binary amplitude holograms made from dyed photoresist

May 13, 2011
Author(s)
Quandou (. Wang, Ulf Griesmann, John H. Burnett
A method for fabricating binary amplitude holograms from a dyed photoresist is described. It is of particular interest for holograms that are used as null lenses in the form metrology of aspheric surfaces and wavefronts. A pigment that strongly absorbs

Power Spectral Density: Is it right?

June 13, 2010
Author(s)
Ulf Griesmann, John Lehan, Jiyoung Chu
We concentrate on the instrumental issues surrounding power spectral density (PSD) determination, using as an example, the most common optical shop QA tool, the Fizeau interferometer. We briefly discuss the properties of an ideal calibration method for PSD

Computer-Generated Hologram Cavity Interferometry Test for Large X-Ray Mandrels: Design

June 1, 2009
Author(s)
Guangjun Gao, John P. Lehan, William W. Zhang, Ulf Griesmann, Johannes A. Soons
A glancing incidence interferometric test for large x-ray mirror mandrels, using two computer generated holograms (CGH s), is described. The two CGH s are used to form a double pass glancing incidence system. One layout of the CGH-cavity glancing incidence

Index of Retraction and its Temperature Dependence of Calcium Fluoride Near 157nm

October 16, 2008
Author(s)
John H. Burnett, Ulf Griesmann, R Gupta, T E. Jou
We have made accurate measurements near 157 nm of the relative index of refraction, its dispersion, and its temperature dependence for two grades of calcium fluoride in N 2 gas. Accurate measurements of the quantitites are needed for the design of lens

Measuring the Phase Transfer Function of a Phase-Shifting Interferometer

August 13, 2008
Author(s)
JiYoung Chu, Quandou (. Wang, John P. Lehan, Ulf Griesmann, Guangjun Gao
In characterizing the performance of a phase-shifting interferometer, the dependence of the measured height on the spatial frequency is rarely considered. We describe a test mirror with a special height relief that can be used to measure the height

Stationary and non-stationary deformations in three-flat tests

July 7, 2008
Author(s)
Ulf Griesmann, Quandou (. Wang, Nicolas Laurenchet, Johannes A. Soons
Calibration procedures for optical reference flats of phase-shifting interferometers (three-flat tests) are critically important if flatness measurements with low uncertainty are desired. In these tests, all combinations of three flats with unknown

Dual-CGH Interferometry Test for X-Ray Mirror Mandrels

June 15, 2008
Author(s)
Guangjun Gao, John Lehan, Ulf Griesmann
We describe a glancing-incidence interferometric double-pass test, based on a pair of computer generated holograms (CGHs), for mandrels used to fabricate x-ray mirrors for space-based x-ray telescopes. The design of the test and its realization are

Three-Flat Test Solutions Including Mounting-Induced Deformations

September 1, 2007
Author(s)
Ulf Griesmann, Quandou (. Wang, Johannes A. Soons
We investigate three-flat calibration methods for circular flats, based on rotation symmetry and mirror symmetry, for absolute interferometric flatness measurements in the presence of deformations caused by the support mechanism for the flats, which are a

Manufacture and Metrology of 300 mm Silicon Wafers with Ultra-Low Thickness Variations

January 2, 2007
Author(s)
Ulf Griesmann, Quandou (. Wang, Marc Tricard, Paul Dumas, Christopher Hill
With the evolution of exposure tools for optical lithography towards larger numerical apertures, the semiconductor industry expects continued demand for improved wafer flatness at the exposure site. The Allowable site flatness for 300 mm wafers is expected

Three-Flat Test Solutions based on Simple Mirror Symmetry

August 1, 2006
Author(s)
Ulf Griesmann
Three-flat tests are the archetypes of measurement procedures used in interferometric surface and wavefront metrology to separate errors in the interferometer reference wavefront from errors due to the tests part surface, so-called absolute tests. A new

Form-Profiling of Optics Using the Geometry Measuring Machine and NIST M-48 CMM

January 1, 2006
Author(s)
Nadia Machkour-Deshayes, John R. Stoup, John Lu, Johannes A. Soons, Ulf Griesmann, Robert S. Polvani
We are developing an instrument, the Geometry Measuring Machine (GEMM), to measure the profile errors of aspheric and free form optical surfaces, which require measurement uncertainties near 1nm. Using GEMM, an optical profile is reconstructed from a set
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