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Displaying 2126 - 2150 of 2717

Trial Shape-Sensitive Linewidth Measurement System

November 1, 2001
Author(s)
John S. Villarrubia, Andras Vladar, Michael T. Postek
This is a report for a project to develop a scanning electron microscope (SEM) based shape-sensitive linewidth measurement system by improving the method by improving the method by which SEM data are analyzed. We report significant developments in

Accuracy and Versatility of the NIST M48 Coordinate Measuring Machine

October 1, 2001
Author(s)
John R. Stoup, Theodore D. Doiron
The NIST Is continuing to develop the ability to perform accurate, traceable measurements on a wide range of artifacts using a very precise, error-mapped coordinate measuring machine (CMM). The NIST M48 CMM has promised accuracy and versatility for many

Some Developments at NIST on Traceability in Dimensional Measurements

October 1, 2001
Author(s)
Dennis A. Swyt, Steven D. Phillips, J Palmateer
This paper reports to the international community on recent developments in technical ;policies, programs, and capabilities at the U.S. National Institute of Standards and Technology (NIST) related to traceability in dimensional measurements. These

NIST-ASME Workshop on Uncertainty in Dimensional Measurements

September 1, 2001
Author(s)
Dennis A. Swyt
A 2 1/2-day workshop on problems in use of uncertainty in dimensional measurements sponsored by NIST and ASME was held June 5-7, 2001, at NIST in Gaithersburg, MD. The workshop was attended by fifty-six representatives of organizations including

NISURF-II, An Upgraded Surface Measuring Facility

September 1, 2001
Author(s)
S Z. Zahwi, M F. Koura, Thomas Brian Renegar, A M. Mekawi
During 1982-1985, a cooperative project was made between the National Bureau of Standards (NBS) at that time (now National Institute of Standards and Technology (NIST - USA)) and the National Institute for Standards (NIS - Egypt) to establish a

Active Monitoring and Control of Electron-Beam-Induced Contaminaition

August 1, 2001
Author(s)
Andras Vladar, Michael T. Postek, R Vane
The vacuum system of all scanning electron microscopes (SEMs), even in the so-called clean instruments, have certain hydrocarbon residues that the vacuum pumps do not effectively remove. The cleanliness of the vacuum and the amount and nature of these

Active Monitoring and Control of Electron-Beam-Induced Contamination

August 1, 2001
Author(s)
Andras Vladar, Michael T. Postek, R Vane
The vacuum systems of all scanning electron microscopes (SEMs), even in the so-called clean instruments, have certain hydrocarbon residues that the vacuum pumps do not effectively remove. The cleanliness of the vacuum and the amount and nature of these

Comparison of Edge Detection Methods Using a Prototype Overlay Calibration Artifact

August 1, 2001
Author(s)
Richard M. Silver, Jay S. Jun, Edward A. Kornegay, R Morton
Accurate overlay measurements rely on robust, repeatable, and accurate feature position determination. In our effort to develop traceable we have examined a number of and the parameters which affect those measurements. The samples used in this study are a

Edge Determination for Polycrystalline Silicon Lines on Gate Oxide

August 1, 2001
Author(s)
John S. Villarrubia, Andras Vladar, J R. Lowney, Michael T. Postek
In a scanning electron microscope (SEM) top-down secondary electron image, areas within a few tens of nanometers of the line edges arc characteristically brighter than the rest of the image. In general, the shape of the secondary electron signal within

Electric Force Microscopy with a Single Carbon Nanotube Tip

August 1, 2001
Author(s)
John A. Dagata, F S. Chien, S Gwo, K Morimoto, T Inoue, J Itoh, H Yokoyama
Carbon nanotube tips offer a significant improvement over standard scanned probe microscope (SPM) tips for electrical characterization of nanodevice structures. Carbon nanotube tips are compatible with requirements for integrated SPM probe station

Problem with Submicrometer-linewidth Standards and A Possible Solution

August 1, 2001
Author(s)
James E. Potzick
Traceable linewidth measurements of tiny features on photomasks and wafers present interesting challenges. Usually technical solutions exist for the problems encountered, but traceability can be costly in time and labor. A measurement is useful only if its

Problem With Submicrometer-Linewidth Standards and a Proposed Solution

August 1, 2001
Author(s)
James E. Potzick
Traceable linewidth measurements of tiny features on photomasks and wafers present interesting challenges. Usually technical solutions exist for the problems encountered, but traceability can be costly in time and labor. A measurement is useful only if its

Reference Material 8091: New Scanning Electron Microscope Sharpness Standard

August 1, 2001
Author(s)
Andras Vladar, Michael T. Postek, Nien F. Zhang, Robert D. Larrabee, Samuel N. Jones, Russell E. Hajdaj
All scanning electron microscope-based inspection instruments, whether they are in a laboratory or on the production line, slowly lose their performance and then the instrument is no longer capable of providing as good quality, sharp images as before. This

Reference Material 8091: New Scanning Electron Microscope Sharpness Standard

August 1, 2001
Author(s)
Andras Vladar, Michael T. Postek, Nien F. Zhang, Robert D. Larrabee, Samuel N. Jones, Russell E. Hajdaj
Reference Material (RM 8091) is intended primarily for use in checking the sharpness performance of scanning electron microscopes. It is supplied as a small, approximately 2 mm x 2 mm diced semiconductor chip. This sample is capable of being mounted

SEM Sentinel-SEM Performance Measurement System

August 1, 2001
Author(s)
Bradley N. Damazo, Andras Vladar, Alice V. Ling, Alkan Donmez, Michael T. Postek, Crossley E. Jayewardene
This paper describes the design and implementation of a system for monitoring the performance of a critical dimension measurement scanning electron microscope (CD-SEM). Experiments were performed for tests involving diagnosis of the vacuum system and
Displaying 2126 - 2150 of 2717
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