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Displaying 56626 - 56650 of 74176

Metrology with the Ultraviolet Scanning Transmission Microscope

May 1, 1995
Author(s)
Richard M. Silver, James E. Potzick, Y Hu
A novel design for an ultraviolet critical dimension measurement transmission microscope utilizing the Stewart platform as the rigid main structure has been implemented. This new design shows improved vibration characteristics and is able to accommodate

Microwave Characterization of Flip-Chip MMIC Components

May 1, 1995
Author(s)
Roger Marks, Jeffrey A. Jargon, C. K. Pao, C. P. Wen, Y. C. Shih
Abstract: We apply custom calibration standards and software to the accurate on-wafer measurement of MIM capacitors and spiral inductors on flip-chip coplanar-waveguide MMICs. We suggest equiva1lent cir­cuit models and document their deficiencies. The

Microwave Characterization of Flip-Chip MMIC Interconnections

May 1, 1995
Author(s)
Roger Marks, Jeffrey A. Jargon, C. K. Pao, C. P. Wen
Abstract: We report accurate on-wafer measurements of transmission lines on flip-chip coplanar-waveguide MMICs. The effects are difficult to predict theoretically, and, without custom standards and unique calibration software, measurements would be

Overlay Measurements and Standards

May 1, 1995
Author(s)
Richard M. Silver, James E. Potzick, Robert D. Larrabee
The relative misalignment of features produced by different mask levels (i.e., overlay error) is projected to become an increasingly important problem to the semiconductor industry as the size of the critical features continues to decrease. In response to

Probabilistic computation of Poiseuille flow velocity fields

May 1, 1995
Author(s)
Fern Y. Hunt, J. F. Douglas, Javier Bernal
Velocity fields for Poiseuille flow through tubes having general cross section are calculated using a path integral method involving the first‐passage times of random walks in the interior of the cross sectional domain D of the pipe. This method is applied

Re-Evaluation of the Accuracy of NIST Photomask Linewidth Standards

May 1, 1995
Author(s)
James E. Potzick
Every artifact measurement standard has some uncertainty associated with its calibration, and the NIST Photomask Linewidth Standards are no exception. This uncertainty is caused by a combination of those factors which influence the calibration measurement

Combustion Product Formation in Under and Overventilated Full-Scale Enclosure Fires

April 23, 1995
Author(s)
William M. Pitts, Nelson P. Bryner, Erik L. Johnsson
The findings of an extensive series of over 140 natural gas fires in a 2/5ths-scale model of a standard room have been previously reported. The current work extends the earlier reduced-scale enclosure (RSE) study to a full-scale enclosure (FSE) and focuses

Tomographic Reconstruction of the Local PDFS of Soot Volume Fraction and Temperature

April 23, 1995
Author(s)
Y. R. Sivathanu, Anthony Hamins, Robert Hagwood, Takashi Kashiwagi
Deconvolution of local properties from line-of-sight measurements is important in a wide variety of applications such as x-ray tomography, nuclear magnetic resonance imaging, atmospheric sciences, optical inteferometry and flow field diagnostics. The Radon
Displaying 56626 - 56650 of 74176
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