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Displaying 52726 - 52750 of 74186

A Microcontamination Model for Rotating Disk Chemical Vapor Deposition Reactors

February 11, 1998
Author(s)
R W. Davis, Elizabeth F. Moore, Donald R. Burgess Jr., Michael R. Zachariah
This paper presents preliminary results from a model currently under development for gas-phase generated submicro-size contaminant particles (i.e., microcontaminants) in rotating disk chemical vapor deposition reactors. These particles present a problem
Displaying 52726 - 52750 of 74186
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