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Displaying 48076 - 48100 of 73779

Vapor Pressure of the SrPbO 3 Perovskite Phase

April 1, 2000
Author(s)
Lawrence P. Cook, Winnie K. Wong-Ng
The perovskite phase SrPbO 3 is important as a buffer and indicator of PbO chemical potential (at fixed p O2 ) according to the reaction: 2 SrPbO 3 --> Sr 2PbO 4 + PbO(g) + 1/2 O2 (g), where the term PbO(g) includes several Pb-containing gaseous species

Security Implementations of Active Content

March 30, 2000
Author(s)
Wayne Jansen, Athanasios T. Karygiannis
Active content documents offer several benefits to both the users of these documents and their authors. Java applets, JavaScript, and ActiveX provide more functionality to static Web pages, plug-ins enable browsers to support new types of content

Electrical Conduction and Dielectric Breakdown in Aluminum Oxide Insulators on Silicon

March 23, 2000
Author(s)
J Kolodzey, E A. Chowdhury, T Adam, G Qui, I Rau, J Olowolafe, John S. Suehle, Y Chen
Leakage currents and dielectric breakdown were studied in MIS capacitors of metal - aluminum oxide - silicon. The aluminum oxide was produced by thermally oxidizing AIN at 800 0C to 1100 0C under dry O 2 conditions. The AIN films were deposited by rf

Watt's Up, Doc? The NIST Watt Experiment and the Future of the Kg

March 21, 2000
Author(s)
J. Schwarz, Ruimin Liu, David B. Newell, Richard L. Steiner, Edwin R. Williams
The Nist Watt Balance is an interesting and beautiful experiment housed in the nonmagnetic building behind the reactor. The underlying physical principles of the experiment are very simple: a current in a magnetic gradient will produce a force that is

In Situ Diffuse Reflectance Spectroscopy for Measurement and Control of III-V Molecular Beam Epitaxy

March 17, 2000
Author(s)
Jonathan E. Guyer, W. F. Tseng, W. R. Thurber, Eric M. Vogel, Monica D. Edelstein, Donald A. Gajewski, Joseph G. Pellegrino
We report the use of diffuse reflectance spectroscopy for active, closed-loop control of substrate temperature during the growth of a modulation doped heterostructure. Measurement and control of substrate temperature is a common difficulty for molecular

An Overview of Nano-Micro-Meso Scale Manufacturing at the NIST

March 13, 2000
Author(s)
E Amatucci, Nicholas Dagalakis, Bradley N. Damazo, Matthew A. Davies, John Evans, Jun-Feng Song, E C. Teague, Theodore V. Vorburger
The future of nano-, micro- and meso-scale manufacturing operations will be strongly influenced by a new breed of assembly and manufacturing tools that will be intelligent, flexible, more precise, include in-process production technologies and make use of
Displaying 48076 - 48100 of 73779
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