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Displaying 41951 - 41975 of 73697

Photomask Dimensional Metrology in the SEM Part I: Has Anything Really Changed?

January 1, 2003
Author(s)
Michael T. Postek, Andras Vladar, Marylyn H. Bennett
Photomask dimensional metrology in the scanning electron microscope (SEM) has not evolved as rapidly as the metrology of resists and integrated circuit features on wafers. This has been due partly to the 4x (or 5x) reduction in the optical steppers and

Potential Benefits of Smart Refrigerant Distributors

January 1, 2003
Author(s)
William V. Payne, Piotr A. Domanski
The main goal of this study was to investigate the benefits possible for finned tube refrigerant evaporators when refrigerant distribution was precisely controlled to produce a desired equal superheat in each circuit. This goal was accomplished by

Practical Aspects of Acoustic Emission Source Location by a Wavelet Transform

January 1, 2003
Author(s)
Marvin A. Hamstad, K S. Downs, Agnes O'Gallagher
An algoithmic approach to improve the accuracy of AE source location was demonstrated by using a large database of wideband-acoustic-emission-(AE)-modeled signals and wavelet transform (WT) results. The AE-signal database was created by a three-dimentional
Displaying 41951 - 41975 of 73697
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