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Displaying 40176 - 40200 of 74099

Rotational Spectra, Conformational Structures and Dipole Moments of 2-(Ethylthio) Ethanol by Jet-Cooled FTMW and Ab Initio Calculations

January 1, 2004
Author(s)
R D. Suenram, David F. Plusquellic, Francis J. Lovas, A H. Walker, Q Liu, L H. Xu, J O. Jensen, A C. Samuels
The rotational spectra of three low-energy conformers of 2-(ethylthio)ethanol also known as ethyl 2-hydroxyethylsulfide or hydroxyethylethyl sulfide (HOEES), together with the monosubstituted C and 34S isotopic forms of the two lowest energy conformers

Rotational Spectrum of Soman

January 1, 2004
Author(s)
R S. DaBell, R D. Suenram, Angela R. Hight Walker, R J. Lavrich, David F. Plusquellic, M W. Ellzy, J M. Lochner, L Cash, J O. Jensen, A C. Samuels

Salt solubility and deposition in high temperature and pressure aqueous solutions

January 1, 2004
Author(s)
M S. Hodes, K A. Smith, Wilbur S. Hurst, Walter J. Bowers Jr., P Griffith, K Sako
Solubility and deposition experiments were performed with aqueous sodium sulfate and potassium sulfate solutions at elevated temperatures and pressures typical of the Supercritical Water Oxidation (SCWO) process. For all experiments the test cell was the

Scattering by a Sphere with a Dielectric Half-Space or on Another Sphere

January 1, 2004
Author(s)
Egon Marx
Particle contamination of dielectric or conducting surfaces can be detected by shining light on the surface and looking for abnormal scattering distributions. This procedure can be simulated by computing the scattering distribution for a dielectric sphere

Scattering Measurements for High Throughput Materials Science Research

January 1, 2004
Author(s)
A I. Norman, J Cabral, Alamgir Karim, Eric J. Amis
High throughput scattering methods are employed to study phase behavior over a concentration gradient of either Polystyrene (PS) in a Polystyrene/Polybutadiene (PS/PB) blend, or of diblock copoly(ethyleneoxide-butyleneoxide) in water. The combinatorial

Shape-Sensitive Linewidth Measurements of Resist Structures

January 1, 2004
Author(s)
John S. Villarrubia, Andras Vladar, Michael T. Postek
Widths of developed 193 nm resist lines were measured by two methods and compared. One method was a new model-based library method. In this method the scanning electron microscope (SEM) images corresponding to various edge shapes are simulated in advance
Displaying 40176 - 40200 of 74099
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