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Displaying 39651 - 39675 of 73697

Multiloop Control of a Nanopositioning Mechanism for Ultraprecision Beam Steering

January 1, 2004

Author(s)

Jason J. Gorman, Nicholas Dagalakis, B G. Boone

Beam steering accuracy is critical to the successful operation of optical communications systems, especially those which take place over extreme length scales, such as for an interstellar spacecraft. In this paper, a novel beam steering mechanism and

Multiplet structure of Feshbach resonances in nonzero partial waves

January 1, 2004

Author(s)

C Ticknor, C A. Regal, D S. Jin, J L. Bohn

NanometrologyPrograms and accomplishments ::FY 2003 program and selected accomplishments

January 1, 2004

Author(s)

Clare Allocca, Stephen Freiman

Narrow line cooling and momentum-space crystals

January 1, 2004

Author(s)

T Loftus, T Ido, M M. Boyd, Andrew D. Ludlow, Jun Ye

Narrow line cooling: finite photon recoil dynamics

January 1, 2004

Author(s)

T Loftus, T Ido, Andrew D. Ludlow, M M. Boyd, Jun Ye

National voluntary laboratory accreditation program: calibration laboratories; technical guide for electromagnetic DC low frequency measurements:

January 1, 2004

Author(s)

C D Faison, Carroll S Brickenkamp

National voluntary laboratory accreditation program: calibration laboratories; technical guide for electromagnetic RF microwave measurements:

January 1, 2004

Author(s)

C D Faison, Carroll S Brickenkamp

National voluntary laboratory accreditation program: calibration laboratories; technical guide for mechanical measurements:

January 1, 2004

Author(s)

C D Faison, Carroll S Brickenkamp

National voluntary laboratory accreditation program: calibration laboratories; technical guide for thermodynamic measurements:

January 1, 2004

Author(s)

C D Faison, Carroll S Brickenkamp

Near Threshold Photoassociation of 87 Rb 2

January 1, 2004

Author(s)

M Kemmann, I Mistrik, Nu&szlig, S Mann, H Helm, Carl J. Williams, Paul S. Julienne

Neutron-Induced Luminescence And Activation In Neutron Shielding and Scintillation Detection Materials At Cryogenic Temperatures

January 1, 2004

Author(s)

S N. Dzhosyuk, C E. Mattoni, D N. McKinsey, Alan Keith Thompson, L Yang, John M. Doyle, P R. Huffman

New Application of High Pressure/Environmental Microscopy to Semiconductor Inspection and Metrology

January 1, 2004

Author(s)

Michael T. Postek, Andras Vladar

High-pressure/environmental scanning electron microscopy has been used to successfully investigate binary and phase-shifting chromium on quartz optical photomasks. This methodology was also applied to patterned193 nm photoresist structures. The application

New Application of Variable-Pressure/Environmental Microscopy to Semiconductor Inspection and Metrology

January 1, 2004

Author(s)

Michael T. Postek, Andras Vladar

Variable-pressure/environmental scanning electron microscopy has been used for successful investigation binary and phase-shifting chromium on quartz optical photomasks. This methodology was also applied to patterned 193 nm photoresist structures. The