December 1, 2002
Author(s)
Michael T. Postek, Andras Vladar, Marylyn H. Bennett
… Photomask dimensional metrology in the scanning electron microscope (SEM) has not evolved as … This has been due partly to the 4x (or 5x) reduction in the optical steppers and scanners used in the lithography process, and partly to the lesser need to … of SPIE, 22nd Annual BACUS Symposium on Photomask Technology, Brian J. Grenon, Kurt R. Kimmel, Editors …