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Neolithography Consortium: A Progress Report

Published

Author(s)

James E. Potzick

Abstract

The role of process simulation is becoming an increasingly important part of microlithography process control and photomask metrology as wafer feature sizes become smaller than the exposure wavelength, because the pattern transfer from photomask to wafer is nonlinear. An important factor hindering the increased use of simulation applications, however, is their inclination to be standalone applications not easily integrated into the overall process. These observations have led to the concept of The Neolithography Consortium. This group is being formed for the purpose of identifying impediments to the integration of simulation and metrology tools into the microlithography process, and finding solutions to remove those impediments. It is comprised mainly of companies who create or use commercial IC microlithography simulation software, or who produce metrology or production tools which interface with simulation software, and their customers. Membership is open to all interested parties.
Proceedings Title
Proceedings of SPIE, 20th Annual BACUS Symposium on Photomask Technology, Brian J. Grenon, Giang T. Dao, Editors
Volume
4186
Conference Dates
September 13-15, 2000
Conference Location
Monterey, CA
Conference Title
Poster Session

Keywords

metrology, microlithography, micropatterning, neolithography, photomask, process control, process optimization, simulation

Citation

Potzick, J. (2001), Neolithography Consortium: A Progress Report, Proceedings of SPIE, 20th Annual BACUS Symposium on Photomask Technology, Brian J. Grenon, Giang T. Dao, Editors, Monterey, CA (Accessed June 15, 2024)

Issues

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Created January 1, 2001, Updated February 19, 2017