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Search Publications

NIST Authors in Bold

Displaying 2451 - 2475 of 4197

QOD Standalone Users Guide

December 16, 2009
Author(s)
Julien C. Cuvillier, Katherine C. Morris
… tools produced by NIST's XML Testbed project within the Manufacturing Systems Integration Division at NIST. These … quality XML schemas using a standards-based approach to manufacturing systems integration. QOD may be used by an XML …

IEEE TC-10: Update 2008

September 22, 2008
Author(s)
Nicholas G. Paulter Jr., Thomas E. Linnenbrink, W. B. Boyer, Robert Graham, S. J. Tilden
There is a world-wide need to standardize terms, test methods, and the computation of performance parameters for devices that generate, measure, and analyze waveforms. Users need to be able to unambiguously specify the device performance required for

Overlay Metrology: Recent Advances and Future Solutions

January 1, 2001
Author(s)
Richard M. Silver, Jay S. Jun, S Fox, Edward A. Kornegay
… levels become increasingly important. Improved manufacturing control over level to level registration has a … maintain the historic pace of increasing device speeds and manufacturing economies of scale. The projected, required 3s …

Managing Digital Libraries for Computer-Aided Design

October 1, 2000
Author(s)
William Regli, V Cicirello
… and process archival for distributed design and manufacturing teams. CAD knowledge-bases are vital to … particular, we focus on archival and reuse of design and manufacturing data for mechatronic systems. This paper …

A New Fabrication Process for Planar Thin-Film Multijunction Thermal Converters

May 1, 2000
Author(s)
Thomas F. Wunsch, Joseph R. Kinard Jr., Ronald R. Manginell, O. M. Solomon, Thomas E. Lipe Jr.
Advanced thin flm processing and packaging technologies are employed in the fabrication of new planar thin-film multijunction thermal converters. The processing packaging, and design features build on experience gained from prior NIST demonstrations of

The International Standard of Length

January 1, 1994
Author(s)
Dennis A. Swyt
This chapter discusses the modern concept of traceability as it applies to CMM measurements of manufactured parts. It shows the means by which those dimensional measurements are functionally related to the international standard of length, the various

Mass Flow Research and Standards: NIST Workshop Results

July 1, 2001
Author(s)
Robert F. Berg, David S. Green, G E. Mattingly
A recent workshop at the National Institute of Standards and Technology (NIST) identified research and standards that will benefit users and manufacturers of mass flow controllers and related equipment. The workshop identified problems with flow

Sustaining Engineering Informatics: Toward Methods and Metrics for Digital Curation

September 1, 2007
Author(s)
Joshua Lubell, Eswaran Subrahmanian, Mahesh Mani, Sudarsan Rachuri
Ensuring the long-term usability of engineering informatics (EI) artifacts is a challenge, particularly for products with longer life cycles than the computing hardware and software used for their design and manufacture. Addressing this challenge requires

Speed of Sound for Understanding Metals in Extreme Environments

October 7, 2024
Author(s)
Elizabeth Rasmussen, Boris Wilthan
… the growing number of next-generation energy, defense, and manufacturing systems operating in extreme environments. … extreme environments include fusion energy, semiconductor manufacturing, metal additive manufacturing, and aerospace. With increased applications, …

NEMI Group Recommends 'Standardized' Lead-Free Solder Alternative

October 12, 2021
Author(s)
J Bath, C A. Handwerker, E Bradley
… lead-contining solder. In 1999, the National Electronics Manufacturing Initiative (NEMI) formed its Lead-Free Task … possible to implement a replacement sooner, avoid multiple manufacturing processes and enhance basic understanding of …

Measurement of a CD and Sidewall Angle Artifact with Two Dimensional CD AFM Metrology

May 1, 1996
Author(s)
Ronald G. Dixson, N. Sullivan, J Schneir, T Mcwaid, V W. Tsai, J Prochazka, M. Young
… widespread acceptance of SEM metrology in semiconductor manufacturing, there is no SEM CD standard currently … objects. As the presence of AFM metrology in semiconductor manufacturing increases, the history of SEM CD metrology … AFM CD artifact possible? What role would it play in the manufacturing environment? Although AFM has some important …
Displaying 2451 - 2475 of 4197
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