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Camera based probes and machine vision have found increased use in coordinate measuring machines over the past years and the calibration of artifacts for these probes has become an important task for NIST. Until recently these artifacts have been
This report collects the executive summaries and visual of twenty-two presentations from an internal workshop on non-contract thermometry at NIST. The workshop took place on April 14, 2000, at NIST in Gaithersburg, Maryland, and was video-conferenced to
We present the basic operating principles of a traceable measurement system for use with scanned probe microscopes and nanometer-resolution displacement sensors. Our method is based upon a tunable external-cavity diode laser system which is Pound-Drever
Mark R. VanLandingham, John S. Villarrubia, G Meyers
Regardless of the type of test, reliable indentation measurements require knowledge of the shape of the indenter tip. For indentation measurements involving sub-micrometer scale contacts, accurate knowledge of the tip shape can be difficult to achieve. In
The NIST Gage Block Calibration Software System is a complete calibration system with custom integrated software to calibrate and measurehigh-precision quality gage blocks as individual blocks or sets, both English and metric. The calibration system has
R Koning, Ronald G. Dixson, Joseph Fu, Theodore V. Vorburger
Although the role of the periodic errors of optical heterodyne interferometers in displacement measurements is fairly well understood, their influence on the calibration of other types of displacement sensors do not seem to be studied as extensively. We
S H. Southworth, L Young, E P. Kanter, Thomas W. LeBrun
Fundamental understanding of x-ray interactions with atoms and molecules provides a basis for applying x-ray methods to complex materials, such as structural determinations by x-ray diffraction and extended x-ray absorption fine structure. Compton
Combining the power of the Internet with state-of-the-art newly emerging international multimedia standards from the International Telecommunications Union (ITU) provides a platform on which to build a next-generation, real-time collaborative metrology
Beginning on or about January 15, 1999, researchers at the National Institute of Standards and Technology (NIST) received partial support from ISEMATECH to collaborate in a mutually defined program designated 1998-1999 NIST/ISEMATECH Collaboration for
William B. Penzes, Robert Allen, Michael W. Cresswell, L Linholm, E C. Teague
Line scales are used throughout industry for a variety of applications. The most common is the stage micrometer, a small graduated glass scale for the calibration of optical instruments such as microscopes. However, stage micrometers are generally not
In this paper a method to validate proposed calibration procedures for coordinate measuring machines (CMMs) is presented. Conceptually, the validation procedure is based on a computer generated population of CMMs assumed to include any real CMM that a
John A. Kramar, Jay S. Jun, William B. Penzes, Fredric Scire, E C. Teague, John S. Villarrubia
At the National Institute of Standards and Technology, we are building a metrology instrument called the Molecular Measuring Machine (M^3) with the goal of performing nanometer- accuracy two-dimensional feature placement measurements over a 50 mm by 50 mm
R Koning, Ronald G. Dixson, Joseph Fu, Thomas Brian Renegar, Theodore V. Vorburger, V W. Tsai, Michael T. Postek
The measurements of bump heights and pit depth on compact discs (CD) with atomic force microscopes (AFMs) are quite different from the measurement of step heights on step height calibration standards. Both the bumps and the pits show much larger transition
R Koning, Ronald G. Dixson, Joseph Fu, Thomas Brian Renegar, Theodore V. Vorburger, V W. Tsai, Michael T. Postek
The measurement of bump heights and pit depth on compact discs (CD) with atomic force microscopes (AFMs) is quite different from the measurement of step heights on step height calibration standards. Both the bumps and the pits show much larger transition
Jack A. Stone Jr., Alois Stejskal, Lowell P. Howard
Diode lasers are becoming increasingly important in length metrology. In particular, the tunability of diode lasers makes them attractive for applications such as absolute distance interferometry (ADI). In this paper we describe the current status of our
Jack A. Stone Jr., Alois Stejskal, Lowell P. Howard
In the last few years there has been much interest in the use of tunable diode lasers for absolute interferometry. Here we report on the use of an external cavity diode laser operating in the visible (λ{approximately} 670 nm) for absolute distance
Jennifer Decker, A Lapointe, John R. Stoup, M V. Alonso, J R. Pekelsky
A varied assortment of 47 new and used steel, ceramic, chromium carbide and tungsten carbide gauge blocks from 9 manufacturers, ranging in length from 05. mm to 101.6 mm were calibrated by four laboratories from the NORAMET countries using the method of
The National Institute of Standards and Technology's Manufacturing Engineering Laboratory (MEL) works with the U.S. manufacturing industry to develop and apply infrastructural technology, measurements, and standards to meet their needs. This report
We review the logical basis of inference as distinct from deduction, and show that measurements in general, and dimensional metrology in particular, are best viewed as exercises in probable inference: reasoning from incomplete information. The result of a
The National Institute of Standards and Technology (NIST) interferometer for measuring graduated length scales has been in use since 1965. It was developed in response to the redefinition of the meter in 1960 from the prototype platinum-iridium bar to the
Theodore D. Doiron, Theodore V. Vorburger, P Sullivan
Defocus effects on step height measurements by interferometric microscopy are estimated using different algorithms to calculate the step height. The interferometric microscope is a Mirau-type with a 20x objective and a numerical aperture (NA) of 0.4. Even
Scattering of electromagnetic waves by homogeneous dielectric or finitely conducting bodies can be reduced to the solution of integral equations. In the simpler cases, only a single-integral-equation is needed, with no increase of required memory over
Samuel N. Jones, Robert D. Larrabee, Michael T. Postek, Andras Vladar, Nien F. Zhang
Fully automated or semi-automated scanning electron microscopes (SEM) are now commonly used in semiconductor production and other forms of manufacturing. Testing and proving that the instrument is performing at a satisfactory level of sharpness is an
Samuel Low, R Gettings, Walter S. Liggett Jr, Jun-Feng Song
Rockwell hardness is a method-dependent measurement of the deformation of a material in response to an applied force. It is not a fundamental physical property of a material. There are no alternative measurement systems to directly or independently measure