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Manufacturing

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Displaying 1801 - 1825 of 2183

NIST Random Profile Roughness Specimens and Standard Bullets

January 1, 2000
Author(s)
Jun-Feng Song, Theodore V. Vorburger, Christopher J. Evans, Michael L. McGlauflin, Eric P. Whitenton, Robert A. Clary
Based on the numerical controlled (NC) diamond turning process used previously for manufacturing random profile roughness specimens, two prototype standard bullets were developed at the National Institute of Standards and Technology (NIST). These standard

Performance Evaluation of a Parallel Cantilever Biaxial Micropositioning Stage

January 1, 2000
Author(s)
E Amatucci, Nicholas Dagalakis, John A. Kramar, Fredric Scire
The phenomenal growth of opto-electronic manufacturing and future applications in micro and nano manufacturing has raised the need for low-cost high performance micro-positioners. The National Institutes of Standards and Technology (NIST) Advanced

Predictive Model for Scanned Probe Oxidation Kinetics

January 1, 2000
Author(s)
John A. Dagata, F Perez-murano, G Abadal, K Morimoto, T Inoue, J Itoh, H Yokoyama
Previous descriptions of scanned probe oxidation kinetics involved implicit assumptions that one-dimensional, steady-state models apply for arbitrary values of applied voltage and pulse duration. These assumptions have led to inconsistent interpretations

Proceedings of a NIST Internal Workshop on Non-Contact Thermometry

January 1, 2000
Author(s)
Howard H. Harary
This report collects the executive summaries and visual of twenty-two presentations from an internal workshop on non-contract thermometry at NIST. The workshop took place on April 14, 2000, at NIST in Gaithersburg, Maryland, and was video-conferenced to

Real-Time Displacement Measurements With a Fabry-Perot Cavity and a Diode Laser

January 1, 2000
Author(s)
Lowell P. Howard, Jack A. Stone Jr.
We present the basic operating principles of a traceable measurement system for use with scanned probe microscopes and nanometer-resolution displacement sensors. Our method is based upon a tunable external-cavity diode laser system which is Pound-Drever

Recent Progress in Nanoscale Indentation of Polymers Using the AFM

January 1, 2000
Author(s)
Mark R. VanLandingham, John S. Villarrubia, G Meyers
Regardless of the type of test, reliable indentation measurements require knowledge of the shape of the indenter tip. For indentation measurements involving sub-micrometer scale contacts, accurate knowledge of the tip shape can be difficult to achieve. In

The NIST Gage Block Calibration Software System User's Manual

January 1, 2000
Author(s)
Jay H. Zimmerman
The NIST Gage Block Calibration Software System is a complete calibration system with custom integrated software to calibrate and measurehigh-precision quality gage blocks as individual blocks or sets, both English and metric. The calibration system has

X-ray Scattering and Fluorescence From Atoms and Molecules

January 1, 2000
Author(s)
S H. Southworth, L Young, E P. Kanter, Thomas W. LeBrun
Fundamental understanding of x-ray interactions with atoms and molecules provides a basis for applying x-ray methods to complex materials, such as structural determinations by x-ray diffraction and extended x-ray absorption fine structure. Compton

SIMnet Design and Internet Deployment Guide

December 29, 1999
Author(s)
Richard D. Schneeman
Combining the power of the Internet with state-of-the-art newly emerging international multimedia standards from the International Telecommunications Union (ITU) provides a platform on which to build a next-generation, real-time collaborative metrology

A New Method to Measure the Distance Between Graduation Lines on Graduated Scales

December 1, 1999
Author(s)
William B. Penzes, Robert Allen, Michael W. Cresswell, L Linholm, E C. Teague
Line scales are used throughout industry for a variety of applications. The most common is the stage micrometer, a small graduated glass scale for the calibration of optical instruments such as microscopes. However, stage micrometers are generally not

A General Quantitative Method to Validate Instrument Calibration Techniques

November 1, 1999
Author(s)
Steven D. Phillips
In this paper a method to validate proposed calibration procedures for coordinate measuring machines (CMMs) is presented. Conceptually, the validation procedure is based on a computer generated population of CMMs assumed to include any real CMM that a

Grating Pitch Measurements With the Molecular Measuring Machine

November 1, 1999
Author(s)
John A. Kramar, Jay S. Jun, William B. Penzes, Fredric Scire, E C. Teague, John S. Villarrubia
At the National Institute of Standards and Technology, we are building a metrology instrument called the Molecular Measuring Machine (M^3) with the goal of performing nanometer- accuracy two-dimensional feature placement measurements over a 50 mm by 50 mm

Step Height Metrology for Data Storage Applications

November 1, 1999
Author(s)
R Koning, Ronald G. Dixson, Joseph Fu, Thomas Brian Renegar, Theodore V. Vorburger, V W. Tsai, Michael T. Postek
The measurements of bump heights and pit depth on compact discs (CD) with atomic force microscopes (AFMs) are quite different from the measurement of step heights on step height calibration standards. Both the bumps and the pits show much larger transition

Step-height Metrology for Data Storage Applications

November 1, 1999
Author(s)
R Koning, Ronald G. Dixson, Joseph Fu, Thomas Brian Renegar, Theodore V. Vorburger, V W. Tsai, Michael T. Postek
The measurement of bump heights and pit depth on compact discs (CD) with atomic force microscopes (AFMs) is quite different from the measurement of step heights on step height calibration standards. Both the bumps and the pits show much larger transition

Absolute Distance Interferometry with a 670-nm External Cavity Diode Laser

October 1, 1999
Author(s)
Jack A. Stone Jr., Alois Stejskal, Lowell P. Howard
Diode lasers are becoming increasingly important in length metrology. In particular, the tunability of diode lasers makes them attractive for applications such as absolute distance interferometry (ADI). In this paper we describe the current status of our

Absolute Interferometry With a 670 nm External Cavity Diode Laser

October 1, 1999
Author(s)
Jack A. Stone Jr., Alois Stejskal, Lowell P. Howard
In the last few years there has been much interest in the use of tunable diode lasers for absolute interferometry. Here we report on the use of an external cavity diode laser operating in the visible (λ{approximately} 670 nm) for absolute distance

NORAMET Comparison of Gauge Block Measurement by Optical Interferometry

October 1, 1999
Author(s)
Jennifer Decker, A Lapointe, John R. Stoup, M V. Alonso, J R. Pekelsky
A varied assortment of 47 new and used steel, ceramic, chromium carbide and tungsten carbide gauge blocks from 9 manufacturers, ranging in length from 05. mm to 101.6 mm were calibrated by four laboratories from the NORAMET countries using the method of

Summaries of the Programs of the Manufacturing Engineering Laboratory 1999

August 2, 1999
Author(s)
Lisa J. Fronczek, Bessmarie A. Young
The National Institute of Standards and Technology's Manufacturing Engineering Laboratory (MEL) works with the U.S. manufacturing industry to develop and apply infrastructural technology, measurements, and standards to meet their needs. This report

Measurement as Inference: Fundamental Ideas

August 1, 1999
Author(s)
William T. Estler
We review the logical basis of inference as distinct from deduction, and show that measurements in general, and dimensional metrology in particular, are best viewed as exercises in probable inference: reasoning from incomplete information. The result of a

The NIST Length Scale Interferometer

July 23, 1999
Author(s)
John S. Beers, William B. Penzes
The National Institute of Standards and Technology (NIST) interferometer for measuring graduated length scales has been in use since 1965. It was developed in response to the redefinition of the meter in 1960 from the prototype platinum-iridium bar to the
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