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The scattering of a plane monochromatic wave by an infinite dielectric wedge is discussed for arbitrary direction of incidence and polarization. Two sets of
Direct patterning of a semiconductor surface to produce an ultrathin oxide mask has proven to be a promising approach for integrating lithographic methods based
This paper describes, with examples, the changes made to the EXPRESS information modeling language between its balloting as an ISO Draft International Standard
Strategies for managing data flow are described for a system which controls processes to compensate machine tool and process errors. A CAD representation of the
A microform calibration procedure has been developed at NIST to certify geometric conformity of Rockwell C hardness indenters. The interest in microform
Current Rockwell C hardness scales (HRC) are unified by performance comparisons. Unless a reliable metrology approach is used for the direct verification of
S Jahanmir, T W. Hwang, Eric P. Whitenton, S Job, Christopher J. Evans
Using an instrumented surface grinder, the two components of grinding forces (normal and tangential) were measured for different types of silicon nitride
L Linholm, Robert Allen, Michael W. Cresswell, Rathindra Ghoshtagore, S Mayo, H Schafft, John A. Kramar
The results from high-quality electrical and physical measurements on the same cross-bridge resistor test structure with approximately vertical sidewalls have
R Misra, T Ha, Y Kadmon, Cedric J. Powell, Mark D. Stiles, Robert McMichael
We have investigated the surface roughness and the grain size in giant magnetoresistance (GMR) spin valve multilayers of the general type: FeMn/Ni 80Fe 20/Co/Cu
M M{umlat}rtz, O Pfister, J. H. Marquardt, M Stephens, J. S. Wells, Hollberg L. Waltman, Hugh Robinson, Richard W. Fox, D Mehuys, E R. Brown, K A. Mcintosh