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Appearance Potentials of Ions Produced by Electron-Impact Induced Dissociative Ionization of SF6 and Related Compounds

Published

Author(s)

Ken L. Stricklett, J. M. Kassoff, James K. Olthoff, Richard J. Van Brunt

Abstract

Methods are described, which are based on the use of a commercial mass spectrometer, for determination of ionization and fragment ion appearance potentials by electron impact. These methods are applied to the principal sulfur-bearing compounds produced by decomposition of SF6 by electrical discharges. The compounds investigated include: SF4, SO2, SOF2, SO2F2, SOF4, SF5Cl, S2F10, S2OF10, and S2O2F10, as well as SF6. Experimental conditions are recommended for improved sensitivity to trace levels of these decomposition by-products in SF6.
Proceedings Title
Proc., Intl. Symp. on Gaseous Dielectrics
Conference Dates
April 24-28, 1994
Conference Location
Knoxville, TN

Keywords

appearance potential, decomposition by-products, electron impact ionization, ionization potential, sulfur hexafluoride

Citation

Stricklett, K. , Kassoff, J. , Olthoff, J. and Van Brunt, R. (1995), Appearance Potentials of Ions Produced by Electron-Impact Induced Dissociative Ionization of SF<sub>6</sub> and Related Compounds, Proc., Intl. Symp. on Gaseous Dielectrics, Knoxville, TN, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=27876 (Accessed May 28, 2024)

Issues

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Created February 28, 1995, Updated October 12, 2021