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This paper presents a bottom up introduction to process modeling requirements for product realization which should drive new methods and computer tools. Though...
The structure and energetics of hydrocarbons burning in a pool fire configuration are reviewed. Examples of non-hydrocarbons are also presented. The character...
C Monroe, A S. Barton, James C. Bergquist, D J. Berkeland, John Bollinger, F C. Cruz, Wayne M. Itano, Steven R. Jefferts, Branislav M. Jelenkovic, B E. King, D M. Meekhof, J D. Miller, M E. Poitzsch, Joseph N. Tan
We have recently used stimulated-Raman transitions in the resolved sideband regime to cool single ions to the n = 0 zero-point energy. This has allowed...
Traditionally, the problem of assembly planning concerns determining an order (linear or partial) of a product assembly with respect to geometric, physical, and...
A new NIST SEM magnification calibration standard has been fabricated and characterized in production prototype form. The SRM 2090A samples contain structures...
Vladimir G. Zaikin, C L. Clifton, S G. Lias, Anzor I. Mikaia, Stephen Stein, O D. Sparkman
Step-by-step procedures of spectra evaluation in the NIST/NIH/EPA mass spectral library is presented. The criteria for data inclusion to the library are...
A thermodynamic model based on the extended corresponding states principle has been developed to calculate the solubilities of nitrogen in five selected agents...
Roger Marks, Jeffrey A. Jargon, C. K. Pao, C. P. Wen
Abstract: We report accurate on-wafer measurements of transmission lines on flip-chip coplanar-waveguide MMICs. The effects are difficult to predict...
Roger Marks, Jeffrey A. Jargon, C. K. Pao, C. P. Wen, Y. C. Shih
Abstract: We apply custom calibration standards and software to the accurate on-wafer measurement of MIM capacitors and spiral inductors on flip-chip coplanar...
Every artifact measurement standard has some uncertainty associated with its calibration, and the NIST Photomask Linewidth Standards are no exception. This...
This paper presents a bottom up introduction to process modeling requirements for product realization which should drive new methods and computer tools. Though...
A novel design for an ultraviolet critical dimension measurement transmission microscope utilizing the Stewart platform as the rigid main structure has been...
J Schneir, T Mcwaid, Ronald G. Dixson, V W. Tsai, John S. Villarrubia, Edwin R. Williams, E Fu
NIST personnel visited 23 IC manufacturing companies and equipment suppliers during 1994 to determine semiconductor industry needs for scanned probe metrology...
Richard M. Silver, James E. Potzick, Robert D. Larrabee
The relative misalignment of features produced by different mask levels (i.e., overlay error) is projected to become an increasingly important problem to the...