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Cedric J. Powell, Aleksander Jablonski, A Naumkin, A Kraut-Vass, Joseph M. Conny, J R. Rumble
A description is given of data resources that are available from the National Institute of Standards and Technology (NIST) for x-ray photoelectron spectroscopy
Geraldine S. Cheok, William C. Stone, Robert R. Lipman, Christoph J. Witzgall, Javier Bernal
This paper summarizes work at the National Institute of Standards and Technology (NIST) in the Non-Intrusive Scanning Technologies for Construction Assessment
This paper is a condensed version of G2001-1853, Peak Non-Gaussian Wind Effects for Database-Assisted Low-Rise Building Design, for publication in the Journal
Laser-ultrasonic methods to measure thin-film elastic properties have been developed. Surface acoustic waves (SAWs) were generated by a 0.2 ns pulsed laser and
Charles E. Gibson, Howard W. Yoon, Benjamin K. Tsai, Bettye C. Johnson, Robert D. Saunders
The Optical Technology Division (OTD) at the National Institute of Standards and Technology (NIST) maintains the thermodynamic temperature scale above the
James E. Maslar, R W. Davis, Elizabeth F. Moore, Donald R. Burgess Jr., D M. Kremer, S H. Ehrman
Gas phase processes occurring during silicon chemical vapor deposition via silane thermal decomposition were investigated. Raman spectroscopy was utilized to
Cedric J. Powell, Joseph M. Conny, Aleksander Jablonski
We give an overview of two issues that are important in quantitative X-ray photoelectron spectroscopy (XPS) and Auger-electron spectroscopy (AES). First, we
The Object Management Group (the consortium that issues the Common Object Request Broker Architecture and Unified Modeling Language standards) is making the
This paper describes applications of and infrastructural technologies for telepresence capabilities within the context of the Information-Based Manufacturing
There are two types of optical sources whose modulation can be measured or calculated from fundamental principles: the hererodyne beat between two single-
As part of the WETICE 2001 conference, the workshop on Evaluating Collaborative Enterprises continued from its debut last year exploring the issues surrounding
We show that the dispersion of multiple cascaded components can be determined from a single low-coherence interferometric measurement. This measurement is not
We have surveyed potential references for 1300 nm and L-band wavelength calibration. We have developed a 1314 nm methane reference for our internal calibration
David P. Pappas, C S. Arnold, G Shalev, C Eunice, D Stevenson, Steven Voran, Mike E. Read, Erin M. Gormley, James Cash, Ken Marr, James Ryan
A scanning magneto-resistive microscope was developed that allows for high resolution imaging of magnetic tapes and digital media. By using second harmonic
Christopher J. Evans, R E. Parks, L Z. Shao, Tony L. Schmitz, Angela Davies
Conventional interferometric testing of the flatness of photomask blanks is rendered difficult by the long coherence length of the HeNe laser sources typically
In order to obtain adequate diffraction data to determine the structure of the protein of interest, crystal quality is important. Although in this context there
Eyal Gerecht, Carl D. Reintsema, Erich N. Grossman, A. L. Betz, R. T. Boreiko
We are developing a heterodyne focal plane array with up to eight elements to study lines with frequencies of 2 THz and above. It is intended for studies of the
The results of a feasibility study to determine if the water sprays produced by residential fire sprinklers can be accurately characterized using phase Doppler
Michael W. Cresswell, N. Arora, Richard A. Allen, Christine E. Murabito, Curt A. Richter, Ashwani K. Gupta, Loren W. Linholm, D. Pachura, P. Bendix
This paper reports a new electrical test structure for measuring the barrier-layer thickness and total physical linewidth of copper-cored interconnect features
The research, measurement and standards activities of the Manufacturing Engineering Laboratory (MEL) at the National Institute of Standards and Technology (NIST
Scanning probe microscopy (SPM) has been used to study polymeric materials with nanometer spatial resolution. Indentation methods based on SPM technology
R W. Davis, Elizabeth F. Moore, James E. Maslar, Donald R. Burgess Jr., D M. Kremer, S H. Ehrman
Driven by a relentless decrease in feature size, the allowable particle contaminant size during semiconductor fabrication is now less than 100 nm. Particles in
The standard test method for evaluating sealant performance is the ASTM C719, which resulted from the pioneering work of NIST researcher Authur Hockman. This
It is now customary for the effects of elastic-electron scattering to be ignored in measurements of the thicknesses of overlayer films by X-ray photoelectron
This is a summary of recent exploratory efforts conducted by the American National Standards Institute (ANSI) Accredited Standards Committee C63, Sub-Committee
Surface finish and imperfections are important properties of optical surfaces because they are caused by manufacturing limitations or defects and are linked to