Frontiers of Characterization and Metrology for Nanoelectronics: Archived Publications and Talks
The Frontiers of Characterization and Metrology for Nanoelectronics (FCMN) conference series brings together scientists and engineers interested in all aspects of the characterization technology needed for nanoelectronic materials and device research, development, and manufacturing. All approaches are welcome: chemical, physical, electrical, magnetic, optical, in-situ, and real-time control and monitoring. The conference summarizes major issues and provides critical reviews of important semiconductor techniques needed as the semiconductor industry moves to silicon nanoelectronics and beyond.
For details on the latest entry in this conference series, please visit the conference website.
Archived Publications
Archived Talks and Posters
Please note that most of the links below are part of the AIP webspace. We have provided the links because they have information that may be of interest to our users. NIST does not necessarily endorse the views expressed or the facts presented on this site. Further, NIST does not endorse any commercial products that may be advertised or available on this site.
Abstract Books and Proceedings
- E.M. Secula and J.A. Liddle, Frontiers of Characterization and Metrology for Nanoelectronics: 2024, 231 p. (15 April 2024)
- E.M. Secula and J. A. Liddle, Frontiers of Characterization and Metrology for Nanoelectronics: 2022, 262 p. (17 June 2022)
- E.M. Secula and D.G. Seiler, Frontiers of Characterization and Metrology for Nanoelectronics: 2019, 248 p. (2 April 2019)
- E.M. Secula and D.G. Seiler, Frontiers of Characterization and Metrology for Nanoelectronics: 2017, 305 p. (20 March 2017)
- E.M. Secula and D.G. Seiler, Frontiers of Characterization and Metrology for Nanoelectronics: 2015, 251 p. (14 April 2015)
- E.M. Secula and D.G. Seiler, Frontiers of Characterization and Metrology for Nanoelectronics: 2013, 350 p. (25 March 2013)
- D. G. Seiler, A. C. Diebold, R. McDonald, C. M. Garner, D. Herr, R. P. Khosla, E. M. Secula, Frontiers of Characterization and Metrology for Nanoelectronics: 2009, American Institute of Physics, Melville, NY, Vol. 1173, 398 pp. (30 September 2009)
- D. G. Seiler, A. C. Diebold, R. McDonald, C. M. Garner, D. Herr, R. P. Khosla, E. M. Secula, Frontiers of Characterization and Metrology for Nanoelectronics: 2007, American Institute of Physics, Melville, NY, Vol. 931, 603 pp. (30 September 2007)
- D. G. Seiler, A. C. Diebold, R. McDonald, C. Ayre, R. Khosla, S. Zollner, E. M. Secula, Characterization and Metrology for ULSI Technology: 2005, American Institute of Physics, Melville, NY, 11747-4502, Vol 788, 667 pp. (28 September 2005)
- D. G. Seiler, A. C. Diebold, T. J. Shaffner, R. McDonald, S. Zollner, R. P. Khosla, E. M. Secula, Characterization and Metrology for ULSI Technology: 2003, American Institute of Physics, Melville, NY, Vol 683, 812 pp. (30 September 2003)
- D. G. Seiler, A. C. Diebold, T. J. Shaffner, R. C. McDonald, W. M. Bullis, P. J. Smith, E. M. Secula, Characterization and Metrology for ULSI Technology: 2000, American Institute of Physics, Melville, NY, Vol 550, pp. 1-708 (1 February 2001)
- D. G. Seiler, A. C. Diebold, W. M. Bullis, T. J. Shaffner, R. C. McDonald, E. J. Walters, Characterization and Metrology for ULSI Technology, American Institute of Physics, Melville, NY, Vol 449 (1 November 1998)
- W. M. Bullis, D. G. Seiler, A. C. Diebold, Semiconductor Characterization: Present Status and Future Needs, American Institute of Physics, Woodbury, NY, 729 p. (1995)
Archived Talks and Posters