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Nanotechnology

Nanofabrication / manufacturing

Tools and Instruments

Keyword

Organizational Unit

NanoFab Tool: Rigaku SmartLab X-Ray Diffraction

The Rigaku SmartLab X-ray diffraction system (XRD) is a fully automated, modular system for advanced x-ray diffraction measurements on a wide range of materials

NanoFab Tool: Sandvik Anneal Furnaces

The two Sandvik anneal furnaces, equipped with silicon carbide tubes, support anneal processing in the NanoFab. The anneal furnaces allow nitrogen, argon and

NanoFab Tool: Sandvik LPCVD LTO

The Sandvik low pressure chemical vapor deposition (LPCVD) of silicon oxide furnace supports low temperature oxide (LTO) on substrates ranging from small chips

NanoFab Tool: Sandvik LPCVD Silicon Nitride

The two Sandvik low pressure chemical vapor deposition (LPCVD) silicon nitride furnaces support stoichiometric and low stress silicon nitride deposition on

NanoFab Tool: Sandvik Oxidation Furnaces

The two Sandvik oxidation furnaces, equipped with silicon carbide tubes, support oxidation processing in the NanoFab. The oxidation furnaces support thermal wet

Photograph of the Semitool PSC-101 double stack spin rinse dryer.

NanoFab Tool: Semitool PSC-101 Spin Rinse Dryer

The Semitool PSC-101 spin rinse dryer uses deionized water to rinse and heated nitrogen to dry whole wafer substrates automatically after wet chemical processes

NanoFab Tool: Sensofar Optical Profilometer

The Sensofar optical profilometer is used to measure height variations including step heights and roughness across a surface using light. It uses a

NanoFab Tool: Silanization Oven

The Silanization Oven is available to users in the Soft Lithography Laboratory. This tool supports the mold adhesion and release processes using organosilanes

NanoFab Tool: SPTS Omega LPX Deep Silicon Etcher

The SPTS Omega LPX deep silicon etcher is an inductively coupled plasma (ICP) etching system used for etching deep features in silicon. The tool uses a fast

NanoFab Tool: SSEC Single Wafer Cleaning System 1

The SSEC model 3300ML single wafer spray acid cleaning system supports general SC1 and Piranha processes in the NanoFab cleanroom. This system mixes, heats and

NanoFab Tool: SSEC Single Wafer Cleaning System 2

The SSEC model 3300ML single wafer spray acid cleaning system supports high purity SC1 and Piranha processes in the NanoFab cleanroom. This system mixes, heats

NanoFab Tool: SSEC Single Wafer Cleaning System 3

The SSEC model 3300ML single wafer spray acid cleaning system supports RCA process in the NanoFab cleanroom. This system mixes, heats and delivers chemicals on

NanoFab Tool: Suss MicroTec SB6 Gen 2 Wafer Bonder

The Suss MicroTec SB6 Gen2 wafer bonder is a substrate bonder that’s equipped to handle a wide range of substrate bonding processes. The bonder accommodates

NanoFab Tool: Thermal Thin-Al Evaporator

The Denton “Bench Top Turbo” thermal evaporator is a single source evaporator equipped with substrate rotation, a thickness monitor, and automatic deposition

Photograph of the Tousimis Autosamdri-815 Series B critical point dryer.

NanoFab Tool: Tousimis Autosamdri-815 Series B

The Tousimis Supercritical Autosamdri-815 Series B critical point dryer utilizes liquid carbon dioxide (LCO 2) to dry substrates in a controlled manner in order

Sample Preparation and Metrology Tools

Read about our sample preparation and metrology tools.

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