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NanoFab Tool: Thermal Thin-Al Evaporator

Thermal Thin-Al Evaporator
Credit: NIST

The Denton “Bench Top Turbo” thermal evaporator is a single source evaporator equipped with substrate rotation, a thickness monitor, and automatic deposition mode of operation. The compact thermal evaporator system is used to coat electron-beam resists with thin conductive, charge dissipation, Aluminum layer to support a variety of projects ranging from disparate fields of engineering, physical and life sciences. Using custom CNST designed holders, the table top thermal evaporator system is capable of accommodating substrate sizes from small pieces up to semi-spec, 100 mm diameter silicon substrates.

Specifications/Capabilities

  • Thin (< 20 nm), thermal evaporation of Al on substrates ranging from small pieces up to semi spec 100 mm diameter silicon substrates.
  • Turbo pumped chamber has a base vacuum of 2.6 x 10-5 Pa (2 x 10-7 Torr).
  • Rotating substrate holder provides uniform film deposition.
  • One thermal evaporation source.
  • Fully automatic operation.

Typical Applications

  • Charge dissipation layer for electron beam lithography.
Created August 26, 2019, Updated December 4, 2019