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NanoFab Tool: SSEC Single Wafer Cleaning System 3

SSEC model 3300ML single wafer spray acid cleaning system

The SSEC model 3300ML single wafer spray acid cleaning system supports RCA process in the NanoFab cleanroom. This system mixes, heats and delivers chemicals on demand and provides better wafer cleaning capability by eliminating cross contamination between wafers. In addition, the automated single wafer cleaning process prevent users from exposure to chemicals. This system can accommodate substrates ranging from 75 mm diameter to 200 mm diameter and irregular wafer pieces. 

Specifications/Capabilities

  • 1.5 MHz tri-megasonic scrubbing nozzle with high flow stream 
  • Single wafer process to eliminate cross contamination
  • Fresh chemicals mixed, heated and delivered on demand 

Usage Information

Supported Sample Sizes

  • Wafer diameter supported: 75 mm (3 inch), 100 mm (4 inch), 150 mm (6 inch), 200 mm (8 inch)
  • Small pieces supported: Yes (25 mm or larger)

Recommended Substrates/Restricted Materials

  • Bare Siliconwafers
  • Bare Quartz wafers
  • Bare Glass wafers
  • Bare Sapphire wafers

Typical Applications

  • Pre-diffusion clean
  • Pre-oxide growth clean
  • Pre-nitride growth clean
Created January 26, 2017, Updated October 19, 2018