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NanoFab Tool: SSEC Single Wafer Cleaning System 1

SSEC model 3300ML single wafer spray acid cleaning system

The SSEC model 3300ML single wafer spray acid cleaning system supports general SC1 and Piranha processes in the NanoFab cleanroom. This system mixes, heats and delivers chemicals on demand and provides better wafer cleaning capability by eliminating cross contamination between wafers. In addition, the automated single wafer cleaning process prevent users from exposure to chemicals. This system can accommodate substrates ranging from 75 mm diameter to 200 mm diameter and irregular wafer pieces. 

Specifications/Capabilities

  • High velocity spray with atomized nitrogen
  • Single wafer process to eliminate cross contamination
  • Fresh chemicals mixed, heated and delivered on demand 

Usage Information

Supported Sample Sizes

  • Wafer diameter supported: 75 mm (3 inch), 100 mm (4 inch), 150 mm (6 inch), 200 mm (8 inch), 125 mm (5 inch) photomask, 150 mm (6 inch) photomask.
  • Small pieces supported: Yes (25 mm or larger)

Recommended Substrates/Restricted Materials

  • Most substrates accepted

Typical Applications

  • Pre-processing clean
  • Post lift-off clean
  • Post etch clean
  • Photomask clean
     
Created January 26, 2017, Updated April 28, 2017