The Semitool PSC-101 spin rinse dryer uses deionized water to rinse and heated nitrogen to dry whole wafer substrates automatically after wet chemical processes. There are two double stack dryers and one single stack dryer in the cleanroom. The systems use a programmable recipe to automatically process wafers.
A resistivity probe is available to monitor the chemical concentration in the bath (called "rinse to resistivity") in order to ensure the complete removal of chemicals.
Nitrogen heater for spot-free drying.
Programmable recipes include rinse, quality rinse, purge, and two dry cycles.
Supported Sample Sizes
Maximum wafer diameter: 200 mm (8 in).
Wafer diameters: 75 mm (3 in), 100 mm (4 in), 150 mm (6 in), and 200 mm (8 in).