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NanoFab Tool: Semitool PSC-101 Spin Rinse Dryer

Photograph of the Semitool PSC-101 double stack spin rinse dryer.
Photograph of the Semitool PSC-101 double stack spin rinse dryer.

The Semitool PSC-101 spin rinse dryer uses deionized water to rinse and heated nitrogen to dry whole wafer substrates automatically after wet chemical processes. There are two double stack dryers and one single stack dryer in the cleanroom. The systems use a programmable recipe to automatically process wafers.


  • A resistivity probe is available to monitor the chemical concentration in the bath (called "rinse to resistivity") in order to ensure the complete removal of chemicals.
  • Nitrogen heater for spot-free drying.
  • Programmable recipes include rinse, quality rinse, purge, and two dry cycles.

Usage Information

Supported Sample Sizes

  • Maximum wafer diameter: 200 mm (8 in).
  • Wafer diameters: 75 mm (3 in), 100 mm (4 in), 150 mm (6 in), and 200 mm (8 in).
  • Mask sizes: 125 mm (5 in), and 150 mm (6 in).
  • Small pieces supported: No.

Typical Applications

  • Wafer and mask rinsing and drying.
Created June 20, 2014, Updated December 4, 2019