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NanoFab Tool: Silanization Oven
Image of Silanization Oven
The Silanization Oven is available to users in the Soft Lithography Laboratory. This tool supports the mold adhesion and release processes using organosilanes. Two organosilanes offered in this tool are APTES and FOTS. The fully automated silanization coating system protects users from exposure to chemicals. It also allows for a wide variety of substrates, processing of wafers up to 200 mm in diameter, and improves the coating process. The system, which replaces the current desiccation process, allows for batch processing with repeatable results and chemical solutions are delivered on demand.
Specifications/Capabilities
- Process temperature: 100°C
- Organosilane deposition: APTES, FOTS
- Single and Batch wafer capabilities
Usage Information
Supported Sample Sizes
- Wafer diameter supported: 75 mm (3 inch), 100 mm (4 inch), 150 mm (6 inch), 200 mm (8 inch)
- Small pieces supported: Yes
Recommended Substrates/Restricted Materials
- No additional chemistries to be used in the tool
Typical Applications
- Release agent treatment
- Adhesion agent treatment
- O2 plasma cleaning