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Gaithersburg

Photograph of the Unaxis 790 reactive ion etcher.

NanoFab Tool: Reactive Ion Etcher Unaxis 790 Right

The Unaxis 790 reactive ion etcher (RIE) is a general purpose parallel plate plasma etching system which uses ionized fluorocarbon gases and oxygen to etch

NanoFab Tool: Reactive Ion Etcher Unaxis 790 Middle

The Unaxis 790 reactive ion etcher (RIE) is a general purpose parallel plate plasma etching system which uses ionized fluorocarbon gases and oxygen to etch

Photograph of the 4Wave IBE-20B ion milling system.

NanoFab Tool: 4Wave IBE-20B Ion Milling System

The 4Wave IBE-20B ion milling system uses a broad argon ion beam to controllably and uniformly remove material from a user's substrate. A secondary ion mass

Photograph of the Tousimis Autosamdri-815 Series B critical point dryer.

NanoFab Tool: Tousimis Autosamdri-815 Series B

The Tousimis Supercritical Autosamdri-815 Series B critical point dryer utilizes liquid carbon dioxide (LCO 2) to dry substrates in a controlled manner in order

Photograph of the Semitool PSC-101 double stack spin rinse dryer.

NanoFab Tool: Semitool PSC-101 Spin Rinse Dryer

The Semitool PSC-101 spin rinse dryer uses deionized water to rinse and heated nitrogen to dry whole wafer substrates automatically after wet chemical processes

Photograph of the Reynolds RCA wet bench.

NanoFab Tool: Reynolds RCA Wet Bench

The Reynolds RCA wet bench is used to remove organic and metal contamination from the surfaces of substrates prior to processing in high temperature furnaces

Photograph of the Reynolds Tech silicon nitride etch wet bench.

NanoFab Tool: Reynolds Tech Silicon Nitride Etch Wet Bench

The Reynolds Tech silicon nitride etch wet bench uses dilute phosphoric acid to preferentially etch silicon nitride on silicon. The process is used to define

Photograph of the Reynolds Tech silicon etch wet bench.

NanoFab Tool: Reynolds Tech Silicon Etch Wet Bench

The Reynolds Tech silicon etch wet bench uses dilute potassium hydroxide (KOH) to preferentially etch silicon along the material's crystal planes. The process

Photograph of the Tousimis Automegasamdri-916B Series C critical point dryer.

NanoFab Tool: Tousimis Automegasamdri-916B Series C

The Tousimis Supercritical Automegasamdri-916B Series C critical point dryer uses liquid carbon dioxide (LCO 2) to dry substrates in a controlled manner in

NanoFab Tool: RCA Wet Bench B102

The Reynolds RCA wet bench is used to remove organic and metal contamination from the surfaces of substrates prior to high temperature furnace processing. The

Photograph of the Kulicke and Soffa Model 4526 wedge wire bonder.

NanoFab Tool: Kulicke and Soffa Model 4526 Wedge Wire Bonder

The Kulicke and Soffa Model 4526 wedge wire bonder provides electrical interconnects between a device chip and package using thin aluminum or gold wires. The

NanoFab Tool: ADT 7132 Dicing Saw

The ADT 7132 dicing saw is used to cut multi-device substrates into individual chips. The system can accommodate substrates up to 1 mm thick and supports sizes

Photograph of the Allied High Tech Dual Prep PH-3 grinding and polishing system.

NanoFab Tool: Allied High Tech Dual Prep PH-3 Grinding and Polishing System

The Allied High Tech Dual Prep PH-3 grinding and polishing system is used to mechanically thin samples and polish cleaved facets in preparation for high

Photograph of the Lattice Gear LatticeAx cleave tool.

NanoFab Tool: Lattice Gear LatticeAx Cleaving Tool

The Lattice Gear LatticeAx cleaving tool is used for highly accurate, manual cleaving of substrates. The system is an indenting and cleaving tool that produces

Photograph of the Fischione Model 1040 NanoMill.

NanoFab Tool: Fischione Model 1040 NanoMill Ion Mill

The Fischione Model 1040 NanoMill is a low-energy, low-angle argon ion milling instrument used for preparing ultra-thin, high-quality transmission electron

NIST Cyber-Physical Systems Public Working Group Kickoff Webinar

Mon, Jun 30 2014

What are Cyber-Physical Systems or CPS? Is a CPS any engineered system with a microprocessor? Do all CPS need to be

Accelerating Green Technology Transfer to Impact American Lives

June 17, 2014

White House Office of Science and Technology Policy Blog Post by Colleen V. Chien, senior advisor to the Chief Technology Officer, Intellectual Property and...

New Members Appointed to Baldrige Advisory Board

June 16, 2014

Secretary of Commerce Penny Pritzker recently reappointed Rulon Stacey as chair of the Baldrige Program's Board of Overseers. She also appointed three new...

New Report Addresses International Disaster Resilience for U.S. and Partner Countries

June 17, 2014

While national security efforts seek to prevent terrorist attacks, the United States and partner countries should also prepare to work together to mitigate the...

NIST to Establish New Centers of Excellence for Work in Forensics, Disaster Resilience

June 13, 2014

Officials at the National Institute of Standards and Technology (NIST) have announced plans to establish two new research Centers of Excellence to work with...

NIST Materials Resource Registry

Materials Resource Registry allows for the registration of materials resources, bridging the gap between existing resources, software and repositories and end

The Internet's Next Big Idea: Connecting People, Information, and Things

June 11, 2014

Blog by Chris Greer, Senior Executive for Cyber-Physical Systems at the National Institute of Standards and Technology In the early 1990s, a Web page consisted...

NIST-MGI Workshop on the First Principles Phase Stability Repository

Thu, Aug 7 - Fri, Aug 8 2014

To populate the FPPS Repository Motivation: To create a repository for First Principles Phase Diagram, (FPPD)

High school student Jessica Young checking the packing density of random aggregates of plastic spheres in a cylinder.

Snowballs to Soot: The Clumping Density of Many Things Seems to Be a Standard

June 10, 2014

Particles of soot floating through the air and comets hurtling through space have at least one thing in common: 0.36. That, reports a research group at the...

Two NIST Researchers Honored with Flemming Awards

June 9, 2014

Two researchers at the National Institute of Standards and Technology (NIST) are among 12 federal employees being honored today* as recipients of the 2013...

NIST Workshop on Standards for the Advancement of Optical Medical Imaging

Tue, Aug 26 - Wed, Aug 27 2014

The NIST Workshop on Standards for the Advancement of Medical Imaging is intended to provide a forum for a broad cross

NanoFab Tool: Specialty Coating Systems PDS 2010 Parylene Deposition System

The Specialty Coating Systems PDS 2010 parylene deposition system provides users with reliable and repeatable conformal parylene coatings ranging from 75

Additive Manufacturing Research Center (AMRC)

The Metal Additive Manufacturing (AM) Research Facility is now called the Additive Manufacturing Research Center (AMRC). Additive manufacturing gives U.S

Cone Calorimeter

In the late 1970s and early 1980s the fire community was pushing for reliable bench-scale tools to measure material flammability based on heat release rate. A

NanoFab Tool: Plasma-Therm Versaline High Density Plasma Enhanced Chemical Vapor Deposition (HD-PECVD)

The Plasma-Therm Versaline high density plasma enhanced chemical vapor deposition (HD-PECVD) system uses an inductively coupled plasma to remotely ionize

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