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Search Publications by: Daniel Sunday (Fed)

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Displaying 26 - 38 of 38

Advancing X-Ray Scattering Metrology Using Inverse Genetic Algorithms

July 7, 2016
Author(s)
Adam F. Hannon, Daniel F. Sunday, Donald A. Windover, Regis J. Kline
We compare the speed and effectiveness of two genetic optimization algorithms to the results of statistical sampling via a Markov Chain Monte Carlo algorithm to find which is the most robust method for determining real space structure in periodic gratings

Scanning electron microscope measurement of width and shape of 10 nm patterned lines using a JMONSEL-modeled library

July 1, 2015
Author(s)
John S. Villarrubia, Andras Vladar, Bin Ming, Regis J. Kline, Daniel F. Sunday, Jasmeet Chawla, Scott List
The width and shape of 10 nm to 12 nm wide lithographically patterned SiO2 lines were measured in the scanning electron microscope by fitting the measured intensity vs. position to a physics-based model in which the lines’ widths and shapes are parameters

Template-Polymer Commensurability and Directed Self-Assembly Block Copolymer Lithography

April 15, 2015
Author(s)
Daniel F. Sunday, Regis J. Kline, Elizabeth Ashley, Lei Wan, Kaniyal Patel, Ricardo Ruiz
The directed self assembly (DSA) of block copolymers (BCP’s) is being explored for lithographic patterning of features between 5 nm and 50 nm. The chemoepitaxial approach towards DSA utilizes a chemical template to promote long range ordering of the BCP

Reducing Block Copolymer Interfacial Widths through Polymer Additives

February 10, 2015
Author(s)
Daniel F. Sunday, Regis J. Kline
There is a need to design new materials to achieve smaller pitches and reduced interfacial widths for use in the nanopatterning of block copolymers (BCPs). One option is the use of blends, where the addition of a homopolymer which selectively associates to

Characterization of Buried Structure in Directed Self Assembly Block Copolymers

July 30, 2014
Author(s)
Daniel F. Sunday, Matthew R. Hammond, Chengqing C. Wang, Wen-Li Wu, Dean M. DeLongchamp, Regis J. Kline, Melia Tjio, Joy Cheng, Jed W. Pitera
The directed self assembly (DSA) of block copolymers (BCP) can multiply or subdivide the pitch of a lithographically defined chemical or topological pattern and is a resolution enhancement candidate to augment conventional lithography for patterning sub-20

Optimizing Hybrid Metrology through a Consistent Multi-Tool Parameter Set and Uncertainty Model

April 14, 2014
Author(s)
Richard M. Silver, Bryan Barnes, Nien F. Zhang, Hui Zhou, Andras Vladar, John S. Villarrubia, Regis J. Kline, Daniel Sunday, Alok Vaid
There has been significant interest in hybrid metrology as a novel method for reducing overall measurement uncertainty and optimizing measurement throughput (speed) through rigorous combinations of two or more different measurement techniques into a single

3D X-ray Metrology for Block Copolymer Lithography Line-Space Patterns

July 15, 2013
Author(s)
Daniel F. Sunday, Matthew R. Hammond, Chengqing C. Wang, Wen-Li Wu, Regis J. Kline, Gila E. Stein
We report on the development of a new measurement method, resonant critical-dimension small-angle x-ray scattering (CD-SAXS), for the characterization of the buried structure of block copolymers (BCP) used in directed self assembly (DSA). We use resonant

Critical Dimension small angel X-ray scattering measurements of FinFET and 3D memory structures

April 8, 2013
Author(s)
Regis J. Kline, Daniel F. Sunday, Chengqing C. Wang, Wen-Li Wu, Charlie Settens, Bunday Benjamin, Brad Thiel, Matyi Richard
Critical dimension small angle X-ray scattering (CD-SAXS) has been identified as a potential solution for measurement of nanoscale lithographic features by interrogating structures with sub-nanometer wavelength radiation in transmission geometry. The most

Intercomparison between optical and x-ray scatterometry measurements of FinFET structures

April 8, 2013
Author(s)
Paul Lemaillet, Thomas Germer, Regis J. Kline, Daniel Sunday, Chengqing C. Wang, Wen-Li Wu
In this paper, we present a comparison of profile measurements of vertical field effect transistor (FinFET) fin arrays by optical critical dimension (OCD) metrology and critical dimension small angle X-ray scattering (CD-SAXS) metrology. Spectroscopic