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Search Publications by: Steven Grantham (Fed)

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Displaying 76 - 100 of 132

Optics for Extreme Ultraviolet Lithography

November 1, 2005
Author(s)
Steven E. Grantham, Charles S. Tarrio, Shannon B. Hill, Thomas B. Lucatorto
Extreme Ultraviolet Lithography (EUVL) is considered by many to be the next generation lithography that will fabricate integrated circuits in the next decade. Although EUVL is conceptually similar to optical or deep-UV lithography, it represents a major

A Simple Transfer-Optics System for an Extreme-Ultraviolet Synchrotron Beamline

April 1, 2005
Author(s)
Charles S. Tarrio, Steven E. Grantham, Robert E. Vest, K Liu
Beamlines at synchrotron radiation facilities often have interchangeable endstations to allow several different experiments to use the output of a single monochromator. However, for endstations that are sufficiently large, this is not possible. We have

Improved Radiometry For Extreme-Ultraviolet Lithography

November 1, 2004
Author(s)
Charles S. Tarrio, Robert E. Vest, Steven E. Grantham, K Liu, Thomas B. Lucatorto, Ping-Shine Shaw
The absolute cryogenic radiometer (ACR), an electrical-substitution-based detector, is the most accurate method for measurement of radiant power in the extreme ultraviolet. At the National Institute of Standards and Technology, ACR-based measurements are

Imaging Material Components of an Integrated Circuit Interconnect

January 1, 2004
Author(s)
Zachary H. Levine, Steven E. Grantham, D J. Paterson, I McNulty, I C. Noyan, T M. Levin
Two regions of interest on a copper/tungsten integrated circuit interconnect were imaged using two techniques: (a) the absorption spectrum was measured at 15 x-ray energies between 1687 eV and 1897 eV; and (b) the x-ray fluorescence spectrum was recorded

Facility for Pulsed Extreme Ultraviolet Detector Calibration

October 8, 2003
Author(s)
Steven E. Grantham, Robert E. Vest, Charles S. Tarrio, Thomas B. Lucatorto
All of the Extreme Ultraviolet light sources currently under consideration for Extreme Ultraviolet lithography are based on plasmas that emit radiation with a wavelength of approximately 13.4 nm. These sources whether they are produced by a discharge or

Design and Performance of Capping Layers for Extreme-Ulatraviolet Multilayer Mirrors

October 1, 2003
Author(s)
Sasa Bajt, H N. Chapman, Nhan Nguyen, J Alameda, J C. Robinson, M Malinowski, E Gullikson, Andrew Aquila, Charles Tarrio, Steven Grantham
Multilayer lifetime has emerged as one of the major issues for the commercialization of extreme-ultraviolet lithography (EUVL). We describe the performance of an oxidation-resistant capping layer of Ru atop multilayers that results in a reflectivity above