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Search Publications by: Eric K. Lin (Fed)

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Displaying 51 - 75 of 199

Effect of Photoacid Generator Concentration and Developer Strength on the Patterning Capabilities of a Model EUV Photoresist

February 25, 2007
Author(s)
Kwang-Woo Choi, Vivek Prabhu, Kristopher Lavery, Eric K. Lin, Wen-Li Wu, John T. Woodward IV, Michael Leeson, H Cao, Manish Chandhok, George Thompson
Current extreme ultraviolet (EUV) photoresist materials do not yet meet requirements on exposure-dose sensitivity, line-width roughness (LWR), and resolution. Fundamental studies are required to quantify the trade-offs in materials properties and

Evaluation of the 3D Compositional Fluctuation Effect on Line-Edge-Roughness

February 25, 2007
Author(s)
Shuhui Kang, Wen-Li Wu, B D. Vogt, Vivek Prabhu, Eric K. Lin, Karen Turnquest
Line-edge-roughness (LER) and the relationship to resist processing and materials design is a critical problem for sub-65 nm photolithography. In this work we investigate how chemical composition fluctuations (heterogeneity) produced by the reaction

FTIR measurements of compositional heterogeneities

February 25, 2007
Author(s)
Shuhui Kang, B D. Vogt, Wen-Li Wu, Vivek Prabhu, David L. VanderHart, Ashwin Rao, Eric K. Lin, Karen Turnquest
A general approach to characterize compositional heterogeneity in polymer thin films using Fourier transform infrared (FTIR) spectroscopy has been demonstrated Polymer films with varying degrees of heterogeneity were prepared using a model chemically

Identifying Materials Limits of Chemically Amplified Photoresists

February 25, 2007
Author(s)
Wen-Li Wu, Vivek Prabhu, Eric K. Lin
Chemically amplified photoresists are likely to remain the primary imaging materials for the semiconductor industry. As feature sizes decrease to dimensions comparable to the characteristic size of the molecules in the photoresist, a significant challenge

Characterization of Compositional Heterogeneity in Chemically Amplified Photoresist Polymer Thin Films with Infrared Spectroscopy

February 9, 2007
Author(s)
Shuhui Kang, B D. Vogt, Vivek Prabhu, Eric K. Lin, Wen-Li Wu, David L. VanderHart, Ashwin Rao, Karen Turnquest
We demonstrate a general approach to characterize compositional heterogeneity in polymer thin films using Fourier transform infrared (FTIR) spectroscopy. Polymer films with varying degrees of heterogeneity were prepared using a model chemically amplified

Measuring Molecular Order in Poly(3-alkylthiophene) Thin Films with Polarizing Spectroscopies

January 16, 2007
Author(s)
Marc Gurau, Dean DeLongchamp, Brandon M. Vogel, Eric K. Lin, Daniel A. Fischer, S Sambasivan, Lee J. Richter
We measured the molecular order of poly(3-alkylthiophene) chains in thin films before and after melting through the combination of several polarized photon spectroscopies: infrared (IR) absorption, variable angle spectroscopic ellipsometry (SE), and near

Combinatorial screening of the effect of temperature on the microstructure and mobility of a high performance polythiophene semiconductor

January 1, 2007
Author(s)
Leah A. Lucas, Dean M. DeLongchamp, Brandon M. Vogel, Eric K. Lin, Michael J. Fasolka, Daniel A. Fischer, Iain McCulloch, Martin Heeney, Ghassan Jabbour
Using a gradient combinatorial approach, the authors report the effects of temperature on the microstructure and hole mobility of poly2,5-bis3-dodecylthiophen-2ylthieno3,2-bthiophene thin films for application in organic field-effect transistors. The

Line Edge Roughness Characterization of Sub-50nm Structures Using CD-SAXS: Round-Robin Benchmark Results

January 1, 2007
Author(s)
Chengqing C. Wang, J C. Roberts, Robert Bristol, B Bunday, Ronald L. Jones, Eric K. Lin, Wen-Li Wu, John S. Villarrubia, Kwang-Woo Choi, James S. Clarke, Bryan J. Rice, Michael Leeson
he need to characterize line edge and line width roughness in patterns with sub-50 nm critical dimension challenges existing platforms based on electron microscopy and optical scatterometry. The development of x-ray based metrology platforms provides a

Thickness Dependence of Microstructure in Semiconducting Films of an Oligofluorene Derivative

December 7, 2006
Author(s)
Dean M. DeLongchamp, Mang-Mang Ling, Youngsuk Jung, Daniel A. Fischer, Mark Roberts, Eric K. Lin, Zhenan Bao
The measurement and optimization of microstructure development in organic semiconductor films is valuable because microstructure in many cases critically impacts electronic performance. We demonstrate a general method to measure microstructure thickness

Evidence for Internal Stresses Induced by Nanoimprint Lithography

November 30, 2006
Author(s)
Hyun Wook Ro, Yifu Ding, Hae-Jeong Lee, Daniel R. Hines, Ronald L. Jones, Eric K. Lin, Alamgir Karim, Wen-Li Wu, Christopher L. Soles
The thermal embossing form of nanoimprint lithography is used to pattern arrays of nanostructures into several different polymer films. The shape of the imprinted patterns is characterized with nm precision using both X-ray scattering and reflectivity

The Effect of Deprotection Extent on Swelling and Dissolution Regimes of Thin Polymer Films

October 28, 2006
Author(s)
Ashwin Rao, Shuhui Kang, B D. Vogt, Vivek M. Prabhu, Eric K. Lin, Wen-Li Wu, M Muthukumar
The response of unentangled polymer thin films to aqueous hydroxide solutions is measured as a function of increasing weakly-acidic methacrylic acid comonomer content produced by an in-situ reaction-diffusion process. Quartz crystal microbalance with

Structural Characteristics of Methylsilsesquioxane Based Porous Low-k Thin Films Fabricated with Increasing Cross-Linked Particle Porogen Loading

September 1, 2006
Author(s)
Hae-Jeong Lee, Christopher L. Soles, Da-Wei Liu, Barry J. Bauer, Eric K. Lin, Wen-Li Wu
Methylsilsesquioxane (MSQ) based porous low-k dielectric films with different porogen loading have been characterized using X-ray porosimetry (XRP) to determine their pore size distribution, average density, wall density and porosity. By varying the

Deprotection Kinetics in 193 nm Photoresist Thin Films: Influence of Copolymer Content

July 25, 2006
Author(s)
Shuhui Kang, Vivek M. Prabhu, B D. Vogt, Eric K. Lin, Wen-Li Wu, Karen Turnquest
The reaction-diffusion mechanism of photoacids is dependent upon many variables including the reaction rate, size of the acid counterion species and temperature. Recent experiments have demonstrated the acid diffusion can be controlled by a combination of

Real Time Shape Evolution of Nanoimprinted Polymer Structures During Thermal Annealing

July 18, 2006
Author(s)
Ronald L. Jones, T Hu, Christopher L. Soles, Eric K. Lin, R M. Reano, Stella W. Pang, D M. Casa
The real time shape of nanoimprinted polymer patterns are measured as a function of annealing temperature and time using a new metrology technique, Critical Dimension Small Angle X-ray Scattering (CD-SAXS). Periodicity, linewidth, line height, and sidewall

Correlating Molecular Design to Microstructure in Thermally Convertible Oligothiophenes: The Effect of Branched versus Linear End Groups

June 8, 2006
Author(s)
Dean M. DeLongchamp, Youngsuk Jung, Daniel A. Fischer, Eric K. Lin, P C. Chang, V Subramanian, A R. Murphy, J M. Frechet
The thin film microstructure development of functionalized oligothiophenes with branched, thermally removable groups at each end of conjugated cores with five, six, and seven thiophene rings was monitored during their thermal conversion from solution