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Search Publications by: Andras E. Vladar (Fed)

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Displaying 101 - 125 of 371

Nanoparticle Size and Shape Evaluation Using the TSOM Method

June 1, 2012
Author(s)
Bradley N. Damazo, Ravikiran Attota, Premsagar P. Kavuri, Andras Vladar
A novel through-focus scanning optical microscopy (TSOM) method that yields nanoscale information from optical images obtained at multiple focal planes will be used here for nanoparticle dimensional analysis. The TSOM method can distinguish not only size

Can We Get 3D CD Metrology Right?

April 19, 2012
Author(s)
Andras Vladar, John S. Villarrubia, Michael T. Postek, Petr Cizmar
Our world is three-dimensional, so are the integrated circuits (ICs), they have always been. In the past, for a long time, we’ve been very fortunate, because it was enough to measure the critical dimension (CD), the width of the resist line to keep IC

Contour Metrology using Critical Dimension Atomic Force Microscopy

April 9, 2012
Author(s)
Ndubuisi G. Orji, Ronald G. Dixson, Andras Vladar, Bin Ming, Michael T. Postek
The critical dimension atomic force microscope (CD-AFM), which is used as a reference instrument in lithography metrology, has been proposed as a supplemental instrument for contour measurement and verification. However, although data from CD-AFM is

Real-Time Image Composition with Correction of Drift Distortion

September 20, 2011
Author(s)
Petr Cizmar, Andras Vladar, Michael T. Postek
In this article, a new scanning electron microscopy (SEM) image composition technique is de- scribed, which can significantly reduce drift-distortion related image corruptions. Drift-distortion commonly causes blur and distortions in the SEM images. Such

Development of the Metrology and Imaging of Cellulose Nanocrystals

September 19, 2011
Author(s)
Michael T. Postek, Andras Vladar, John A. Dagata, Natalia Farkas, Bin Ming, Ryan Wagner, Arvind Raman, Robert J. Moon, Ronald Sabo, Theodore H. Wegner, James Beecher
The development of metrology for nanoparticles is a significant challenge. Cellulose nanocrystals (CNC) are one group of nanoparticles that have high potential economic value but present substantial challenges to the development of the measurement science

Review of Current Progress in Nanometrology with Helium Ions

September 19, 2011
Author(s)
Michael T. Postek, Andras Vladar, Bin Ming, Charles Archie
Scanning electron microscopy has been employed as an imaging and measurement tool for more than 50 years and it continues as a primary tool in many research and manufacturing facilities across the world. A new challenger to this work is the helium ion

Accurate Nanometer-Scale Imaging and Measurements with SEM

August 18, 2011
Author(s)
Bradley N. Damazo, Bin Ming, Premsagar P. Kavuri, Andras Vladar, Michael T. Postek
Scanning electron microscopes (SEMs) are incredibly versatile instruments for millimeter to nanometer scale imaging and measurements of size and shape. New methods to improve repeatability and accuracy have been implemented on the so-called Reference SEMs

Advanced Image Composition with Intra-Frame Drift Correction

July 19, 2011
Author(s)
Petr Cizmar, Andras Vladar, Michael T. Postek
Drift Corrected Image Composition (DCIC) is a real-time technique that allows for acquiring significantly more accurate images compare to traditional slow or fast imaging methods.[Ref.] It is especially useful in nanometer-scale imaging and metrology

TSOM Method for Semiconductor Metrology

April 18, 2011
Author(s)
Ravikiran Attota, Ronald G. Dixson, John A. Kramar, James E. Potzick, Andras Vladar, Benjamin D. Bunday, Erik Novak, Andrew C. Rudack
Through-focus scanning optical microscopy (TSOM) is a new metrology method that achieves 3D nanoscale measurement resolution using conventional optical microscopes; measurement sensitivities are comparable to what is typical using Scatterometry, SEM and