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PUBLICATIONS

Modeling for Accurate Dimensional Scanning Electron Microscope Metrology: Then and Now

Published

Author(s)

Michael T. Postek, Andras Vladar

Abstract

A review of the evolution of modeling for accurate dimensional scanning electron microscopy is presented with an emphasis on developments in the Monte Carlo technique for SEM dimensional metrology. The progress of modeling for accurate metrology is discussed through a schematic technology timeline. In addition, a discussion of a future vision for accurate SEM dimensional metrology and the requirements to achieve it are presented.
Citation
Scanning
Volume
33
Pub Type
Journals

Download Paper

Local Download

Keywords

SEM, Monte Carlo modeling, Metrology, Accuracy, Critical Dimensions, Electron-solid interactions
Manufacturing

Citation

Postek, M. and Vladar, A. (2011), Modeling for Accurate Dimensional Scanning Electron Microscope Metrology: Then and Now, Scanning, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=908153 (Accessed October 12, 2025)

Issues

If you have any questions about this publication or are having problems accessing it, please contact [email protected].

Created July 20, 2011, Updated February 19, 2017
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