Postek, M.
and Vladar, A.
(2011),
Modeling for Accurate Dimensional Scanning Electron Microscope Metrology: Then and Now, Scanning, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=908153 (Accessed April 25, 2026)
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Modeling for Accurate Dimensional Scanning Electron Microscope Metrology: Then and Now
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Abstract
A review of the evolution of modeling for accurate dimensional scanning electron microscopy is presented with an emphasis on developments in the Monte Carlo technique for SEM dimensional metrology. The progress of modeling for accurate metrology is discussed through a schematic technology timeline. In addition, a discussion of a future vision for accurate SEM dimensional metrology and the requirements to achieve it are presented.Citation
Scanning
Volume
33
Pub Type
Journals
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Keywords
SEM, Monte Carlo modeling, Metrology, Accuracy, Critical Dimensions, Electron-solid interactions
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Created July 20, 2011, Updated February 19, 2017