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Modeling for Accurate Dimensional Scanning Electron Microscope Metrology: Then and Now

Published

Author(s)

Michael T. Postek, Andras Vladar

Abstract

A review of the evolution of modeling for accurate dimensional scanning electron microscopy is presented with an emphasis on developments in the Monte Carlo technique for SEM dimensional metrology. The progress of modeling for accurate metrology is discussed through a schematic technology timeline. In addition, a discussion of a future vision for accurate SEM dimensional metrology and the requirements to achieve it are presented.
Citation
Scanning
Volume
33

Keywords

SEM, Monte Carlo modeling, Metrology, Accuracy, Critical Dimensions, Electron-solid interactions

Citation

Postek, M. and Vladar, A. (2011), Modeling for Accurate Dimensional Scanning Electron Microscope Metrology: Then and Now, Scanning, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=908153 (Accessed April 22, 2024)
Created July 20, 2011, Updated February 19, 2017