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Search Publications by: Sushil K Satija (Fed)

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Displaying 26 - 50 of 170

Surface interaction parameter measurement of solvated polymers via model end-tethered chains

August 11, 2017
Author(s)
Richard J. Sheridan, Sara V. Orski, Ronald L. Jones, Sushil K. Satija, Kathryn L. Beers
We present a method for the direct measurement of the relative energy of interaction between a solvated polymer and a solid interface. By tethering linear chains covalently to the surface, we ensured the idealized and constant configuration of polymer

Reduction of Domain Spacing and Interfacial Width in Fast Ordering Nanofilled Copolymer Films by Direct Immersion Annealing

November 10, 2016
Author(s)
Melanie Longanecker, Arvind Modi, Andrey Dobrynin, Seyong Kim, Guangcui Yuan, Ronald L. Jones, Sushil K. Satija, Joona Bang, Alamgir Karim
Block copolymers (BCPs) offer a convenient templating method on the nanoscale to organize nanoparticles within a polymer film for the enhancement of various properties. For functional applications that require high nanoparticle loadings, this is often more

Structure of Polyelectrolyte Brushes in the Presence of Multivalent Counterions

August 9, 2016
Author(s)
Jing Yu, Jun Mao, Guangcui Yuan, Sushil K. Satija, Zhang Jiang, Wei Chen, Matthew Tirrell
Polyelectrolyte brushes are of great importance to a wide range of fields, ranging from colloidal stabilization to responsive and tunable materials to lubrication. We synthesized high-density polystyrene sulfonate (PSS) brushes using surface force

Nanostructures and Dynamics of Macromolecules Bound to Attractive Filler Surfaces

August 18, 2015
Author(s)
Naisheng Jiang, Maya K. Endoh, Tadanori Koga, Tomomi Masui, Hiroyuki Kishimoto, Michihiro Nagao, Sushil K. Satija, Takashi Taniguchi
We report in-situ structures and dynamics of polybutadiene (PB) chains bound to carbon black (CB) fillers (the so-called "bound polymer layer (BPL)") in a good solvent. The BPL on the CB fillers were extracted by solvent leaching of a CB-filled PB compound

Determination of the Effective Transverse Coherence of the Neutron Wave Packet as Employed in Reflectivity Investigations of Condensed-Matter Structures. I. Measurements

March 27, 2014
Author(s)
Charles F. Majkrzak, Christopher Metting, Brian B. Maranville, Joseph A. Dura, Sushil K. Satija, Terrence J. Udovic, Norman F. Berk
The primary purpose of this investigation is to determine the effective coherent extent of the neutron wave packet transverse to its mean propagation vector k, as prepared in a typical instrument used to study the structure of materials in thin film form

Polymer-Fullerene Mixing in Organic Solar Cells

August 2, 2012
Author(s)
Hyun Wook Ro, Bulent Akgun, Regis J. Kline, Chad R. Snyder, Sushil K. Satija, Christopher L. Soles, Dean M. DeLongchamp, Michael F. Toney, Alexander L. Ayzner, Brendan T. O'Connor, Matthew Hammond
The mixing behavior of the hole and electron transporting materials in bulk heterojunction (BHJ) organic photovoltaic (OPV) blends plays a key role in determining the nanoscale morphology, which is believed to be a decisive factor in determining device

Water is a Poor Solvent for Densely Grafted Poly(ethylene oxide) Chains: A Conclusion Drawn from a Self-Consistent Field Theory-Based Analysis of Neutron Reflectivity and Surface Pressure-Area Isotherm Data

May 22, 2012
Author(s)
Hoyoung Lee, Dae Hwan Kim, Kevin N. Witte, Kimberly Ohn, Je Choi, Bulent Akgun, Sushil K. Satija, You-Yeon Won
By using a combined experimental and theoretical approach, a model poly(ethylene oxide) (PEO) brush system, prepared by spreading a poly(ethylene oxide)-poly(n-butyl acrylate) (PEO-PnBA) amphiphilic diblock copolymer onto an air-water interface, was

Neutron reflectivity characterization of the photoacid reaction-diffusion latent and developed images of molecular resists for extreme-ultraviolet lithography

May 11, 2012
Author(s)
Vivek M. Prabhu, Shuhui Kang, Wen-Li Wu, Sushil K. Satija, Christopher K. Ober, Jing Sha, Peter V. Bonnesen
Lithographic feature size requirements have approached a few radius of gyration of chemically-amplified photoresist polymers used in thin film patterning. Further, the feature dimensions are commensurate with the photoacid diffusion length that defines the