Prabhu, V.
, Kang, S.
, Wu, W.
, Satija, S.
, Ober, C.
, Sha, J.
and Bonnesen, P.
(2012),
Neutron reflectivity characterization of the photoacid reaction-diffusion latent and developed images of molecular resists for extreme-ultraviolet lithography, Advanced Functional Materials, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=908575
(Accessed December 12, 2024)