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Search Publications by: Sushil K Satija (Fed)

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Displaying 51 - 75 of 85

Direct Measurement of the Counterion Distribution Within Swollen Polyelectrolyte Films

July 19, 2005
Author(s)
Vivek M. Prabhu, B D. Vogt, Wen-Li Wu, Eric K. Lin, Jack F. Douglas, Sushil K. Satija, D L. Goldfarb, H Ito
The depth profile of the counterion concentration within thin polyelectrolyte films was measured in situ using contrast variant specular neutron reflectivity to characterize the initial swelling stage of the film dissolution.Wefind substantial counterion

Direct Measurement of the Counterion Distribution Within Swollen Polyelectrolyte Films

May 20, 2005
Author(s)
Vivek M. Prabhu, B D. Vogt, Wen-Li Wu, Jack F. Douglas, Eric K. Lin, Sushil K. Satija, D M. Goldfarb, H Ito
A depth profile of the counterion concentration within thin polyelectrolyte films was measured in-situ using contrast variant specular neutron reflectivity to characterize the initial swelling stage of the film dissolution. We find a substantial counterion

Interfacial Structure of Photoresist Thin Films in Developer Solutions

March 1, 2005
Author(s)
Vivek M. Prabhu, B D. Vogt, Wen-Li Wu, Jack F. Douglas, Sushil K. Satija, D M. Goldfarb, H Ito
The development step is critical to the fabrication of nanostructures in chemically amplified photoresist technology. With critical dimensions (CD) shrinking to sub-100 nm and the concurrent reduction in exposure radiation wavelength, line-edge roughness

Water Distribution Within Immersed Polymer Films

February 1, 2005
Author(s)
B D. Vogt, Christopher Soles, Vivek Prabhu, Sushil K. Satija, Eric K. Lin, Wen-Li Wu
The emergence of immersion lithography as a potential alternative for the extension of current lithography tools will require a fundamental understanding of the interactions between the photoresist and the immersion liquid such as water. The water

Water Immersion of Model Photoresists: Interfacial Influences on Water Concentration and Surface Morphology

February 1, 2005
Author(s)
B D. Vogt, D L. Goldfarb, M Angelopoulos, Christopher Soles, C M. Wang, Vivek Prabhu, P M. McGuiggan, Jack F. Douglas, Eric K. Lin, Wen-Li Wu, Sushil K. Satija
Immersion lithography has emerged as an alternative to the 157 nm node and as such understanding of the interactions between the photoresist and immersion fluid (water) has become a pressing issue. The water concentration within the model photoresist films

Interfacial Effects on Moisture Absorption in Thin Polymer Films

June 1, 2004
Author(s)
B D. Vogt, Christopher L. Soles, Ronald L. Jones, C M. Wang, Eric K. Lin, Wen-Li Wu, Sushil K. Satija, D L. Goldfarb, M Angelopoulos
Moisture absorption in model photoresist films of poly(4-hydroxystryene) (PHOSt) and poly(tert-butoxycarboxystyrene) (PBOCSt) was measured by x-ray and neutron reflectivity. The degree of swelling in the films upon moisture exposure was found to be

Finite-Size Effects on Surface Segregation in Polymer Blend Films Above and Below the Critical Point of Phase Separation

March 1, 2004
Author(s)
H Grull, Li Piin Sung, Alamgir Karim, Jack F. Douglas, Sushil K. Satija, Makoto Hayashi, H Jinnai, TT Hashimoto, Charles C. Han
We investigate the influence of temperature and confinement on surface segregation in thin films of deuterated polybutadiene and polyisoprene near the critical point for phase separation. Neutron reflectivity measurements show that polyisoprene enriches at

Interdiffision in Polystyrene and End-Functional Polystyrene Thin Films Near a Solid Surface

September 10, 2003
Author(s)
Chengqing C. Wang, Vivek M. Prabhu, Christopher L. Soles, B D. Vogt, Wen-Li Wu, Eric K. Lin, Sushil K. Satija
Polymer interdiffusion near the polymer/solid interface is studied using neutron reflectometry. Bilayers of hydrogenated polystyrene (hPS) and deuterated polystyrene (dPS) or hydrogenated dicarboxy terminated polystyrene (hPS(COOH)2) and dPS are prepared

Interdiffusion in Polystyrene and End-Functional Polystyrene Thin Films Near a Solid Surface

September 1, 2003
Author(s)
C M. Wang, Vivek Prabhu, Christopher Soles, B D. Vogt, Wen-Li Wu, Eric K. Lin, Sushil K. Satija
Polymer interdiffusion near the polymer/solid interface is studied using neutron reflectometry. Bilayers of hydrogenated polystyrene (hPS) and deuterated polystyrene (dPS) or hydrogenated dicarboxy terminated polystyrene (hPS(COOH)2) and dPS are prepared

Rapid Deformation of Thin Gold Layers in Polymer Matrices Studied by X-Ray Reflectivity

August 1, 2003
Author(s)
K Shin, H Wang, Sushil K. Satija, Charles C. Han, Daniel Josell, John E. Bonevich
We have used X-ray reflectivity to measure the morphological profiles of thin Au layers of three different average thicknesses sandwiched between two polystyrene layers with different molecular weights, Mw = 52.3k and Mw - 168.5k. The results showed that

Measurement of the Spatial Evolution of the Deprotection Reaction Front With Nanometer Resolution Using Neutron Reflectometry

December 1, 2002
Author(s)
Eric K. Lin, Sushil K. Satija, Wen-Li Wu, Christopher L. Soles, D L. Goldfarb, B C. Trinque, S D. Burns, Ronald L. Jones, Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, M Angelopoulos, C G. Willson
The use of chemically amplified photoresists for the fabrication of sub-100 nm features will require spatial control with nanometer level resolution. To reach this goal, a detailed understanding of the complex reaction-diffusion mechanisms at these length

Direct Measurement of the Reaction Front in Chemically Amplified Photoresists

July 1, 2002
Author(s)
Eric K. Lin, Sushil K. Satija, Wen-Li Wu, Christopher L. Soles, D L. Goldfarb, B C. Trinque, S D. Burns, Ronald L. Jones, Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, M Angelopoulos, C G. Willson
The continuing drive by the semiconductor industry to fabricate smaller structures with photolithography will soon require dimensional control at length scales, (2 to 5) nm, comparable to the size of the polymeric molecules in the materials used to pattern

Suppression of Lateral Phase Separation in Thin Polyolefin Blend Films

March 1, 2001
Author(s)
Y A. Akpalu, Alamgir Karim, Sushil K. Satija, N P. Balsara
The effectiveness of a compatibilizer in suppressing lateral phase separation in thin polyolefin blend films is investigated as a function offilm thickness and temperature. Neutron and x-ray reflectivity measurements were made on spun cast thin blend films

Materials Research With Neutrons at NIST

February 1, 2001
Author(s)
Ronald L. Cappelletti, Charles J. Glinka, Susan T. Krueger, Richard M. Lindstrom, Jeffrey W. Lynn, Henry J. Prask, E Prince, John J. Rush, J. Michael Rowe, Sushil K. Satija, B H. Toby, A. Tsai, Terrence J. Udovic