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Control of Interface Nanoscale Structure Created by Plasma-Enhanced Chemical Vapor Deposition

Published

Author(s)

Someswara R. Peri, Bulent Akgun, Sushil K. Satija, Hao Jiang, Jesse Enlow, Timothy J. Bunning, Mark D. Foster
Citation
ACS Applied Materials and Interfaces
Volume
3

Keywords

PECVD, feed position, plasma power, interface structure, neutron reflectivity

Citation

Peri, S. , Akgun, B. , Satija, S. , Jiang, H. , Enlow, J. , Bunning, T. and Foster, M. (2011), Control of Interface Nanoscale Structure Created by Plasma-Enhanced Chemical Vapor Deposition, ACS Applied Materials and Interfaces, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=905520 (Accessed February 23, 2024)
Created August 28, 2011, Updated October 12, 2021