March 1, 2017
Author(s)
Enric Menendez, Hiwa Modarresi, Claire Petermann, Josep Nogues, Neus Domingo, Haoliang Liu, Brian Kirby, Amir Syed Mohd, Zahir Salhi, Earl Babcock, Stefan Mattauch, Chris Van Haesendonck, Andre Vantomme, Kristiaan Temst
The combination of lithography and ion implantation is demonstrated to be a suitable method to prepare lateral multilayers. A laterally, compositionally and magnetically, modulated microscale patter consisting of alternating C (1.6υm-wide) and Co-CoO (2