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Displaying 1301 - 1325 of 1921

Excited States at Surfaces: Fano Profiles in STM Spectroscopy of Adsorbates

March 1, 2000
Author(s)
John William Gadzuk, M Plihal
The Fano-Anderson model for a discrete state embedded within a continuum is revisited within the context of excitation and decay processes which lead to some manifestations of Fano lineshape profiles. The phenomenon of resonance tunneling between an STM

Chemical Science and Technology Laboratory 1999 Technical Activities Report

February 1, 2000
Author(s)
Hratch G. Semerjian, W Koch
This report summarizes the research and services provided by the Chemical Science and Technology Laboratory of the National Institute of Standards and Technology for Fiscal Year 1999. The report includes: a general overview of the laboratory's activities

Gate Dielectric Thickness Metrology Using Transmission Electron Microscopy

January 1, 2000
Author(s)
J H. Scott, Eric S. Windsor, D Brady, J Canterbury, A. Karamcheti, W Chism, A C. Diebold
Silicon Oxynitride blanket films approximately 2 n min thickness are characterized in cross section using a 300 keV TEM/STEM. High resolution imaging is used to investigate the accuracy and precision of TEM film thickness measurements and their

Energy Dispersive X-Ray Spectrometry With the Transition Edge Sensor Microcalorimeter: A Revolutionary Advance in Materials Microanalysis

December 1, 1999
Author(s)
Dale E. Newbury, David A. Wollman, Kent D. Irwin, Gene C. Hilton, John M. Martinis
The NIST microcalorimeter energy dispersive x-ray spectrometer provides important advances in x-ray spectrometry. The high spectral resolution, approaching 2 eV for photon energies below 2 keV, the wide photon energy coverage, 250 eV to 10 keV, and the
Displaying 1301 - 1325 of 1921
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