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Application of CW-CRDS to Monitor and Control Chemical Vapor Deposition

Published

Author(s)

David S. Green, J P. Looney, G W. Rubloff

Abstract

Continuous wave excitation cavity ring-down spectroscopy (CW-CRDS) is being evaluated for real time chemical sensing of volatile CVD byproducts (e.g. HF, H2O) and as a quantitative and robust metrology tool for advanced process control methodologies.
Proceedings Title
2000 IEEE/LEOS Summer Topical Meeting : Optical Sensing in Semiconductor Manufacturing
Conference Dates
July 24-26, 2000
Conference Location
Aventura, FL

Keywords

cavity ring down, chemical vapor deposition, diode laser, hydrogen fluoride, metrology, process control, semiconductor

Citation

Green, D. , Looney, J. and Rubloff, G. (2000), Application of CW-CRDS to Monitor and Control Chemical Vapor Deposition, 2000 IEEE/LEOS Summer Topical Meeting : Optical Sensing in Semiconductor Manufacturing, Aventura, FL (Accessed June 20, 2024)

Issues

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Created July 1, 2000, Updated February 19, 2017