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Displaying 56501 - 56525 of 74176

Improved Photomask Metrology Through Exposure Emulation

July 1, 1995
Author(s)
James E. Potzick
The ultimate purpose of the photomask in IC manufacture is to define the image to be printed on a silicon wafer. Of the many factors which affect this aerial image in the wafer stepper, some are properties of the stepper projection system and some are

In Situ Testing and Calibrating of Z-Piezo of an Atomic Force Microscope

July 1, 1995
Author(s)
Joseph Fu
By scanning a slightly tilted, smooth surface with an atomic force microscope (AFM), it is possible to obtain hysteresis loops which contain information on the nonlinearity and hysteresis in the z axis of the AFM''s piezoelectric actuator. A 15% variation
Displaying 56501 - 56525 of 74176
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