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NIST Authors in Bold

Displaying 55526 - 55550 of 74202

Measurement of a CD and Sidewall Angle Artifact with Two Dimensional CD AFM Metrology

May 1, 1996
Author(s)
Ronald G. Dixson, N. Sullivan, J Schneir, T Mcwaid, V W. Tsai, J Prochazka, M. Young
Despite the widespread acceptance of SEM metrology in semiconductor manufacturing, there is no SEM CD standard currently available. Producing such a standard is challenging because SEM CD measurements are not only a function of the linewidth, but also

New Algorithm for the Measurement of Pitch in Metrology Instruments

May 1, 1996
Author(s)
Nien F. Zhang, Michael T. Postek, Robert D. Larrabee, L Carroll, William J. Keery
Traditionally, the measurement of pitch in metrology instruments is thought to be a benign self-compensating function. However, as the measurement uncertainty of metrology instruments is pushed to the nanometer level, evaluation of the performance of the

NIST Construction Automation Initiative

May 1, 1996
Author(s)
William C. Stone
Before we get started, let me introduce a few key people who have helped to organize this workshop. I would like to thank Ken Goodwin from the Manufacturing Engineering Laboratory (MEL), Kent Reed from the Building and Fire Research Laboratory (BFRL), and

Real-Time GPS and Non-Line-of-Sight Metrology

May 1, 1996
Author(s)
William C. Stone
I would like to pick up where Eric left off and describe the results of research which is currently underway at NIST in the field of construction metrology. Earlier I indicated that there were many technological steps along the way to implementing the real

SEM Performance Evaluation Using the Sharpness Criterion

May 1, 1996
Author(s)
Michael T. Postek, Andras Vladar
Fully automated or semi-automated scanning electron microscopes (SEM) are now commonly used in semiconductor production and other forms of manufacturing. The industry requires that an automated instrument must be routinely capable of 5 nm resolution (or

Nanostructure Fabrication via Laser-Focused Atomic Deposition

April 15, 1996
Author(s)
Robert Celotta, R Gupta, R E. Scholten, Jabez McClelland
Nanostructured materials and devices will play an important role in a variety of future technologies, including magnetics. We describe a method for nanostructure fabrication based on the use of laser light to focus neutral atoms. The method uses neither a

An Architecture and a Methodology for Intelligent Control

April 1, 1996
Author(s)
Hui-Min Huang
We outline a multiple dimensional reference model architecture and a methodology for representing and developing intelligent systems. The reference model architecture features multiple dimensions enabling modeling the multiple aspects of complex systems
Displaying 55526 - 55550 of 74202
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