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Displaying 53626 - 53650 of 73898

Information Technology: The Fifth Text REtrieval Conference [TREC-5]

November 1, 1997
Author(s)
Ellen M. Voorhees, Donna K. Harman
This paper serves as an introduction to the research described in the remainder of the proceedings. It defines the common retrieval tasks performed in TREC-5, the test collections used, and the evaluation methodology. The overview of the retrieval results

Low-Temperature Elastic Coefficients of Polycrystalline Indium

November 1, 1997
Author(s)
K Sudook, H M. Ledbetter
Using an ultrasonic pulse-echo method, we measured the elastic coefficients of polycrystalline indium from 300 to 5K. All elastic coefficients showed regular temperature behavior, as predicted by an Einstein-oscillator model. The shear and Young moduli

Measurements of the LIGO Pathfinder Optics

November 1, 1997
Author(s)
R E. Parks, Christopher J. Evans, P Sullivan, Lianzhen Shao, B Loucks
A number of 150 mm apertures in 250 mm diameter plano-concave optics with figure errors of a few nm were carefully tested using phase measuring interferometry and the data reduced using pixel based absolute testing techniques. We discuss some of the data

Metal Capillaries for Neutron Lenses

November 1, 1997
Author(s)
P. L. Reeder, A. J. Peurrung, D. S. Sunberg, J. J. Stoffels, Huaiyu H. Chen-Mayer, David F. Mildner, V. A. Sharov, V. S. Fokin

Metrology of Scattering with Angular Limitation Projection Electron Lithography Masks

November 1, 1997
Author(s)
J E. Liddle, M Blakey, T Saunders, R Farrow, L Fetter, C Kneurek, R Kasica, et al, M Peabody, Shannon L. Takach, D L. Windt, Michael T. Postek
Mask metrology is a vital part of any lithographic technology, both for control of the mask patterning process and also for ensuring that the contribution of the mask to the system error budget is within acceptable limits. For design rules of 0.13 ?m and

NIST Measurement Assurance Program for Resistance

November 1, 1997
Author(s)
Paul A. Boynton, June E. Sims, Ronald F. Dziuba
The National Institute of Standards and Technology (NIST) offers resistance Measurement Assurance Program (MAP) transfers at the 1 ohm and 10 k ohm levels, to provide a method of assessing and maintaining the quality of a customer's measurement process

Project Summaries 1997; NIST Building and Fire Research Laboratory

November 1, 1997
Author(s)
Noel J. Raufaste Jr
The National Institute of Standards and Technology's [NIST], Building and Fire Research Laboratory [BFRL] is one of NIST's seven Laboratories. The mission of BFRL is to enhance the competitiveness of U.S. industry and public safety by developing

Report of the 82nd National Conference on Weights and Measures

November 1, 1997
Author(s)
B W. Palys
The 82nd Annual Meeting of the National Conference of Weights & Measures [NCWM], was held July 20 through July 24, 1997 at the Swiss hotel, Chicago, Illinois. The theme of the meeting was Fostering International Harmony in Legal Metrology. Reports by the

Representations and Methodologies for Assembly Modeling

November 1, 1997
Author(s)
Kevin W. Lyons, Venkat Rajan, Raj Sreerangam
Most products are assemblies of components. The number of components can range from a few tens to a few millions. Design of electro-mechanical assemblies involves the description of the constraints between a group of parts that allows them to behave in the
Displaying 53626 - 53650 of 73898
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