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Displaying 51901 - 51925 of 74483

Accuracy Differences Among Photomask Metrology Tools and Why They Matter

December 1, 1998
Author(s)
James E. Potzick
A variety of different kinds of photomask critical dimensions (CD) metrology tools are available today to help meet current and future metrology challenges. These tools are based on different operating principles, and have different cost, throughput

Characteristics of Partial Discharges on a Dielectric Surface in SF 6 -N 2 Mixtures

December 1, 1998
Author(s)
X. Han, Yicheng Wang, Loucas G. Christophorou, Richard J. Van Brunt
An important tool for improving the reliability of HV-insulation systems relies on partial discharge (PD) measurements. The assessment of the insulation failure of HV equipment using PD measurements requires an interpretation of the PD measurements

Characterization and Applications of On-Wafer Diode Noise Sources

December 1, 1998
Author(s)
Lawrence P. Dunleavy, James P. Randa, Dave K. Walker, Robert L. Billinger, John Rice
A set of wafer-probeable diode noise source transfer standards are characterized using on-wafer noise-temperature methods developed at the National Institute of Standards and Technology (NIST), Boulder, CO.

Chemical Limits to Flame Inhibition

December 1, 1998
Author(s)
Valeri I. Babushok, Wing Tsang, Gregory T. Linteris, D Reinelt
This paper deals with the ultimate limits of chemical contributions to flame inhibition. Particular attention is focussed on the inhibition cycles which regenerate the inhibitor. This leads to the definition of an idealized "perfect" inhibition cycle. It
Displaying 51901 - 51925 of 74483
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