April 10, 2012
Author(s)
Ravikiran Attota, Abraham Arceo, Benjamin Bunday, Victor Vertanian
… changes at the nanoscale, such as small perturbations in sidewall angle and height, with little or no ambiguity, … (CD), photomask, overlay and defect metrologies [8]. In-line defect metrology is continuously challenged by the … bright-field techniques currently used in semiconductor manufacturing will not be able to meet …