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Displaying 6076 - 6100 of 13218

Glass and Dimensional Metrology

April 1, 1997
Author(s)
Theodore D. Doiron
Ordinary glass, even good optical quality glass, will shrink up to 20 micrometers/meter over the first few years after its manufacture. Gages made of glass are therefore not suitable as high accuracy artifacts unless they are calibrated often. Better

Resonant cavity dielectric spectroscopy for quality assurance evaluations of secure documents

January 31, 2020
Author(s)
Mary Kombolias, Jan Obrzut, Yaw S. Obeng
… when it is manufactured for or used as a substrate in security printing products. However, most tests to … arts substrates are destructive and ex situ, resulting in a loss of information. Other tests may be non- destructive … lend it well to further applications in secure document manufacturing. …

A SUPER-METAMODELLING FRAMEWORK TO OPTIMIZE SYSTEM PREDICTABILITY

August 25, 2018
Author(s)
Yan Lu, Douglas Eddy, Sundar Krishnamurty, Ian Grosse
… Statistical metamodels can robustly predict manufacturing process and engineering systems design results. … metamodeling techniques for a wide diversity of data sets, in this paper we introduce a super-metamodel optimization … manufacturing process data shows method effectiveness in practice. …

Reflections on the Role of Science in the Evolution of Dimensioning and Tolerancing Standards

April 23, 2012
Author(s)
Vijay Srinivasan
… and tolerancing standards originated about 75 years ago in the form of various national and company standards that … what geometric variations designers can tolerate in a product without compromising the product’s intended … 1980s when the emergence of computer-aided design and manufacturing systems forced a drastic reexamination of these …

Running Out of Time: Improvements Required In Current Semiconductor Factory and Equipment Clock Synchronization for Supporting Future Real-Time Data Collection

September 23, 2004
Author(s)
Ya-Shian Li-Baboud, Brad Van Eck, Eric D. Simmon
… introduction all challenge higher initial yield, lower manufacturing costs, and time to market demands. Among the … to be collected and analyzed from the process equipment, in-line metrology, and factory environmental conditions. … and timestamps are fundamental to achieving e-Manufacturing paradigms such as Advanced Process Control …

Photomask Critical Dimension Metrology in the Scanning Electron Microscope

April 7, 2004
Author(s)
Michael T. Postek
… (SEM) remains an important tool, which is extensively used in many phases of semiconductor manufacturing throughout the world. The SEM provides higher … of a particular specimen, device, or circuit.. MT Postek. in: J Orloff, ed. Handbook of Charged Particle Optics. CRC …

Advancing Technical Language Processing and Large Language Models in Industrial Applications: Insights from TLP COI Events in 2024

December 2, 2025
Author(s)
Michael Dawson, Sarah Lukens, Michael Sharp
… these challenges by tailoring NLP approaches for use in technical and engineering domains. As a nascent field, community-driven events have played a crucial role in facilitating dialogue on emerging issues and potential … (COI), overseen by the National Institute of Standards and Technology (NIST), organized two events: a two day virtual …

User Perceptions & Preferences for Smart Home Device Updates

November 5, 2021
Author(s)
Susanne M. Furman, Julie Haney
… devices. Yet, security professionals view difficulties in patching IoT devices as a major threat. However, … relate to security and privacy perceptions and practices. In an interview study investigating consumers' experiences … quotes from the interview study to illustrate points found in the broader survey. Results include: participant's …
Displaying 6076 - 6100 of 13218
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