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Search Publications

NIST Authors in Bold

Displaying 651 - 675 of 2915

Improving Fatigue Strength of Alumina through Surface Grading

May 9, 2011
Author(s)
Yvonne B. Gerbig, Linlin Ren, Lela Liu, Sanjit Bhowmick, Malvin Janal, Van Thompson, Yu Zhang
Porcelain veneered alumina crown restorations often fail from bulk fracture resulting from radial cracks that initiate at the cementation surface with repeated flexure of the stiffer crown layers on the soft dentin support. We hypothesize that bulk

NIST s Integrated Colony Enumerator (NICE)

August 11, 2009
Author(s)
Matthew L. Clarke, Jeeseong Hwang
Enumeration of bacterial colonies in an agar plate is simple in concept, but automated colony counting is difficult due to variations in colony color, size, shape, contrast, and density, as well as colony overlap. Furthermore, in applications where high

A Model of Melting and Dripping Thermoplastic Objects in Fire

March 17, 2009
Author(s)
Kathryn M. Butler
A model of the melting and dripping behavior of thermoplastic materials in fire is being developed using the Particle Finite Element Method (PFEM), which is capable of tracking the large changes in shape inherent to this problem in addition to solving the

Unsupervised Learning of Dislocation Motion

October 14, 2019
Author(s)
Darren Pagan, Thien Q. Phan, Jordan Weaver, Austin Benson, Armand Beaudoin
… uniaxial plastic deformation of an additively manufactured nickel-based superalloy. With the aid of a physics-based …

NIST Experiments in Gas Atomization 1986-1999

June 1, 2004
Author(s)
Steven P. Mates, Frank S. Biancaniello, S D. Riddle
… of this data, which includes aluminum, copper, iron and nickel-based alloys, is presented here to augment the data …

Effects of Lightpipe Proximity on Si Wafer Temperature in Rapid Thermal Processing Tools

September 1, 2003
Author(s)
Kenneth G. Kreider, D H. Chen, D P. DeWitt, William A. Kimes, Benjamin K. Tsai
curate temperature measurements are critical in rapid thermal processing (RTP) of silicon wafers for thermal oxidation and dopant anneals. Many RTP tools use lightpipe radiation thermometers (LPRTs) to measure the wafer temperatures during processing

Developments in the Ni-Nb-Zr Amorphous Alloy Membranes

March 1, 2016
Author(s)
S. Sarker, D. Chandra, M. Hirscher, M. Dolan, D. Isheim, J. Wermer, D. Viano, M. Baricco, Terrence J. Udovic, D. Grant, O. Palumbo, A. Paolone, R. Cantelli
… Amorphous, Hydrogen Permeation, Membranes, Metallic Glass, Nickel, Niobium, Zirconium … Developments in the Ni-Nb-Zr …

Enhanced Mass Transport in Ultra-Rapidly-Heated Ni/Si Thin-Film Multilayers

November 15, 2009
Author(s)
Lawrence P. Cook, Richard E. Cavicchi, Nabil Bassim, Susie Eustis, Winnie Wong-Ng, Igor Levin, Ursula R. Kattner, Carelyn E. Campbell, Christopher B. Montgomery, William F. Egelhoff Jr., Mark D. Vaudin
… … calorimeter, metastable, multilayer, nanocalorimeter, nickel, phase diagram, silicide, silicon … Enhanced Mass …

Prediction of the [Na 1/2 Bi 1/2 ] TiO 3 Ground State

February 1, 2001
Author(s)
Benjamin P. Burton, Eric J. Cockayne
The Vienna Ab-initio Simulation Package (VASP) was used to perform fully relaced, planeware psudopotential calculations of formation energies (δE V ASP) for a large number of ordered supercells in the perovskite based system NaTiO 3 - BiTiO 3, including 36

Effects of Lightpipe Proximity on Si Wafer Temperature in Rapid Thermal Processing Tools

September 1, 2003
Author(s)
Kenneth G. Kreider, D H. Chen, D P. DeWitt, William A. Kimes, Benjamin K. Tsai
Lightpipe radiation thermometers (LPRTs) are the preferred temperature monitoring sensor in most rapid thermal processing (RTP) tools for semiconductor fabrication. These tools are used for dopant anneal, gate oxide formation, and other high temperature
Displaying 651 - 675 of 2915
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