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Modeling of Solvent Evaporation Effects for Hot Plate Baking of Photoresist

Published

Author(s)

C A. Mach, D P. DeWitt, Benjamin K. Tsai, G Yetter
Citation
SPIE
Volume
2195

Citation

Mach, C. , DeWitt, D. , Tsai, B. and Yetter, G. (1994), Modeling of Solvent Evaporation Effects for Hot Plate Baking of Photoresist, SPIE (Accessed April 14, 2024)
Created December 31, 1993, Updated October 12, 2021