Modeling Chamber Radiation Effects on Pyrometric Temperature Measurement in Rapid Thermal Processing

Published

May 2, 1999

Author(s)

F Rosa, Yong Zhou, Z M. Zhang, D P. DeWitt, Benjamin K. Tsai

Abstract

A detailed analysis of the radiation environment in the lower chamber of the RTP test bed at the National Institute of Standard and Technology (NIST) is performed to improve the accuracy of radiation thermometry. The models developed in this work consider the non-uniform temperature and/or heat flux distributions on the silicon wafer and the cold plate. The diffuse-gray enclosure model has been extended to predict the spectral effective emissivity as well as to include a specularly reflected shield. A simplified Monte Carlo model is also developed to account for the directional dependence of the reflectance of the silicon wafer and the cold plate. Parametric studies are performed to evaluate the effect that the radiative properties, temperature, and geometric arrangement have on the effective emissivity. The importance of the radiometer opening size on the heat flux distribution is demonstrated. This work will contribute toward a better understanding of radiation heat transfer in RTP furnaces and improvement of radiometric temperature measurement in those systems.

Proceedings Title

195th Meeting of the Electrochemical Society

Volume

99-10

Conference Dates

May 2-6, 1999

Conference Location

Undefined

Conference Title

Electrochemical Society

Pub Type

Conferences

Download Paper

Local Download

Keywords

accuracy, enclosures, modeling, Monte Carlo methods, radiation thermometry, radiometers, rapid thermal processing, silicon wafers, temperature

Citation

Rosa, F. , Zhou, Y. , Zhang, Z. , DeWitt, D. and Tsai, B. (1999), Modeling Chamber Radiation Effects on Pyrometric Temperature Measurement in Rapid Thermal Processing, 195th Meeting of the Electrochemical Society, Undefined, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=841367 (Accessed October 18, 2025)