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Metrology

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Displaying 2076 - 2100 of 2718

Photomask Dimensional Metrology in the SEM: Has Anything Really Changed?

December 1, 2002
Author(s)
Michael T. Postek, Andras Vladar, Marylyn H. Bennett
Photomask dimensional metrology in the scanning electron microscope (SEM) has not evolved as rapidly as the metrology of resists and integrated circuit features on wafers. This has been due partly to the 4x (or 5x) reduction in the optical steppers and

Standards for Bullets and Casings

November 1, 2002
Author(s)
Jun-Feng Song, Theodore V. Vorburger, Robert A. Clary, Eric P. Whitenton, Li Ma, Susan M. Ballou
The National Institute of Standards and Technology is developing reference standards through its Office of Law Enforcement Standards with funding provided by the National Institute of Justice. The standard reference materials are used by crime laboratories

Atomic Force Microscopy of Semiconductor Line Edge Roughness

October 1, 2002
Author(s)
N G. Orji, Jayaraman Raja, Theodore V. Vorburger
Over the last two decades the width of patterned lines on semiconductor devices has continuously decreased. Based on technology trends predicted by the International Technology Roadmap for Semiconductors (ITRS), the linewidth of isolated gate lines on

NIST RM (Reference Material) 8240/8250 Standard Bullets and Casings Project

September 1, 2002
Author(s)
Jun-Feng Song, Theodore V. Vorburger, Susan M. Ballou, M Ols
The NIST RM (Reference Material) 8240/8250 Standard Bullets and Casings Project aims to support the National Integrated Ballistics Information Network (NIBIN) in the U.S. Two prototype standard bullets were developed in 1998 with all six lands manufactured

Tolerancing Form Deviations for Rockwell Diamond Indenters

September 1, 2002
Author(s)
Jun-Feng Song, Samuel R. Low III, Li Ma
The spherical tip of Rockwell diamond indenters tends to be manufactured either a flat- or sharp-shaped surface because of the anisotropy property of the diamond. This can cause significant differences in the hardness readings. In order to control that

Establishment of Ballistics Measurement Traceability Using NIST RM 8240 Standard Bullets

August 1, 2002
Author(s)
Jun-Feng Song, Theodore V. Vorburger, Robert A. Clary, Eric P. Whitenton
The NIST RM (Reference Material) 8240 standard bullets are being developed to support the traceability of ballistics measurements nationwide. Six master bullets from ATF and FBI are measured at NIST using a stylus measurement system. The resulting set of

Standards for Optical Imaging Systems in Forensic Laboratories

August 1, 2002
Author(s)
Jun-Feng Song, Theodore V. Vorburger, Robert A. Clary, Eric P. Whitenton, Li Ma, Susan M. Ballou
NIST RM (Reverence Material) 8240/2350 standard bullet and casing project is currently ongoing to support the National Integrated Ballistics Information Network (NIBIN) in the US. The original bullet signatures were traced on six master bullets from

SRM 2460/2461 Standard Bullets and Casings Project

July 10, 2002
Author(s)
Jun-Feng Song, Eric P. Whitenton, David R. Kelley, Robert A. Clary, L Ma, Susan M. Ballou, M Ols
The National Institute of Standards and Technology (NIST) Standard Reference Material (SRM) 2460/2461 standard bullets and casings project will provide support to firearms examiners and to the National Integrated Ballistics Information Network (NIBIN) in

Comparison of Measured Optical Image Profiles of Silicon Lines with Two Different Theoretical Models

July 1, 2002
Author(s)
Richard M. Silver, Ravikiran Attota, Michael T. Stocker, Jay S. Jun, Egon Marx, Robert D. Larrabee, B Russo, M P. Davidson
In this paper we describe a new method for the separation of too-induced measurement errors and sample-induced measurement errors. We apply the method to standard overlay target configurations. This method is used to separate the effects of the tool and

Scanning Electron Microscope Analog of Scatterometry

July 1, 2002
Author(s)
John S. Villarrubia, Andras Vladar, J R. Lowney, Michael T. Postek
Optical scatterometry has attracted a great deal of interest for linewidth measurement due to its high repeatability and capability of measuring sidewall shape. We have developed an analogous and complementary technique for the scanning electron microscope

The Challenge of Nanometrology

July 1, 2002
Author(s)
Michael T. Postek
The promise and challenge of nanotechnology is immense. The National Nanotechnology Initiative provides an opportunity to develop a new technological base for U.S. Industry. Nanometrology is the basis of the new measurement methods that must be developed

Two-dimensional Simulation Modeling in Imaging and Metrology Research

July 1, 2002
Author(s)
Michael T. Postek, Andras Vladar, J R. Lowney, William J. Keery
Traditional Monte Carlo modeling of the electron beam-specimen interactions in a scanning electron microscope (SEM) produces information about electron beam penetration and output signal generation at either a single beam-landing location, or multiple
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