Workshop Summary Report: Scanning Probe Nanolithography Workshop

Published

January 1, 2003

Author(s)

John A. Dagata, H Yokoyama, F Perez-murano

Abstract

A workshop on Scanning Probe Microscope (SPM)-based Nanolithography was held at NIST Gaithersburg on November 24-25, 2003.  The meeting was sponsored by the Precision Engineering Division, Manufacturing Engineering Laboratory, NIST, under a Research Cooperation Agreement on advanced lithography of functional nanostructures signed in 2001 by the National Microelectronics Center of Spain (CNM), the National Institute of Advanced Industrial Science & Technology (AIST) of Japan, and NIST.  A dozen active collaborators of NIST, AIST, and CNM projects in this emerging field presented their most recent results on fundamental aspects of nanostructure fabrication and characterization and on the application of SPM nanostructures to nano-electronics, nano-optics, and nano-mechanical devices.

Citation

NIST Interagency/Internal Report (NISTIR) - 7040

Report Number

7040

NIST Pub Series

NIST Interagency/Internal Report (NISTIR)

Pub Type

NIST Pubs

Keywords

electronics, lithography, microfluids, scanning probe microscopy, scanning probe oxidation

Citation

Dagata, J. , Yokoyama, H. and Perez-murano, F. (2003), Workshop Summary Report: Scanning Probe Nanolithography Workshop, NIST Interagency/Internal Report (NISTIR), National Institute of Standards and Technology, Gaithersburg, MD (Accessed October 13, 2024)