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Jason P. Campbell, Kin P. Cheung, Serghei Drozdov, Richard G. Southwick, Jason T. Ryan, Tony Oates, John S. Suehle
A recently developed series resistance (RSD) extraction procedure from a single nanoscale device is shown to be highly robust. Despite these virtues, the technique unexpectedly results in a channel length-dependent RSD which is observed across a wide range
Philippe V. Afonso, Mirkka Janka-Junttila, Young Jong Lee, Colin P. McCann, Charlotte M. Oliver, Khaled A. Aamer, Wolfgang Losert, Marcus T. Cicerone, Carol A. Parent
Neutrophil recruitment to inflammation sites purportedly depends on sequential waves of chemoattractants. Current models propose that LTB4, a secondary chemoattractant secreted by neutrophils in response to primary chemoattractants such as formyl-peptides
David E. Morris, Melissa L. Mather, Carl Simon Jr., John A. Crowe
The performance of polymer based scaffolds used in regenerative medicine is linked to their structural properties and as such strategies for structural characterization of scaffolds have been developed. X-ray microscopic computed tomography (X-ray micro CT
Atif A. Imtiaz, Thomas M. Wallis, SangHyun S. Lim, H. Tanbakuchi, H-P Huber, A. Hornung, P. Hinterdorfer, J. Smoliner, F. Kienberger, Pavel Kabos
We report frequency dependent contrast in d(S11)/dV measurements of a variably doped p-type silicon sample in the frequency range from 2GHz to 18GHz. The measurements were conducted bys use of a scanning microwave microscope. The measurements were done at
Andras Vladar, John S. Villarrubia, Michael T. Postek, Petr Cizmar
Our world is three-dimensional, so are the integrated circuits (ICs), they have always been. In the past, for a long time, weve been very fortunate, because it was enough to measure the critical dimension (CD), the width of the resist line to keep IC
Richard M. Silver, Jing Qin, Bryan M. Barnes, Hui Zhou, Ronald G. Dixson, Francois R. Goasmat
There has been much recent work in developing advanced optical metrology applications that use imaging optics for critical dimension measurements, defect detection and for potential use with in-die metrology applications. Sensitivity to nanometer scale
Bryan M. Barnes, Martin Y. Sohn, Francois R. Goasmat, Hui Zhou, Richard M. Silver, Abraham Arceo
Smaller patterning dimensions and novel architectures are fostering research into improved methods of defect detection in semiconductor device manufacturing. This initial experimental study, augmented with simulation, evaluates scatterfield microscopy to
Conni Hanke, Petra S. Dittrich, Darwin Reyes-Hernandez
A new system for dielectrophoretic cell capture on porous polyester (PET) membranes is presented. Conventional photolithographic techniques were used to fabricate gold microelectrodes on a PET membrane. We characterized these electrodes to proof that there
John S. Villarrubia, Aron Cepler, Benjamin D. Bunday, Bradley Thiel
In-line, non-destructive process control metrology of high aspect ratio (HAR) holes and trenches has long been a known gap in metrology. Imaging the bottoms of at-node size beyond 10:1 AR contact holes in oxide has not yet been demonstrated. Nevertheless
In this paper, we use a variety of analytical techniques to examine the impact of local chemistry, and the mechanical properties, of the encapsulation dielectric films on the post-packaging device rejection rate of integrated circuit devices. A strong
We report on the development of a method for rapidly characterizing the glycan binding properties of lectins. Catanionic surfactant vesicles were prepared that spontaneously formed in water and remained stable at room temperature for months. By varying the
Eric N. Dattoli, Albert Davydov, Kurt D. Benkstein
The selectivity of a chemiresistive gas sensor comprising an aligned array of single-crystalline tin oxide nanowires (NWs) is shown to be greatly enhanced by combined temperature and gate voltage modulation. This dual modulation was effected by utilization
Pragya R. Shrestha, Adaku Ochia, Kin P. Cheung, Jason P. Campbell, Helmut Baumgart, Gary Harris
Accurate capture of the Set/Reset characteristics is a necessary but challenging task for the development of memristive switches. Here we describe and demonstrate a technique capable of meeting this challenge. This technique can measure the transient
Qin Zhang, Guangle Zhou, Huili G. Xing, Alan C. Seabaugh, Kun Xu, Sio Hong, Oleg A. Kirillov, Curt A. Richter, Nhan Van Nguyen
The electron energy band alignment of a metal-oxide-semiconductor tunnel field-effect transistor (TFET) heterojunction, W/Al2O3/InGaAs/InAs/InP is determined by internal photoemission spectroscopy. At the oxide flat-band condition, the barrier height from
Yvonne B. Gerbig, Chris A. Michaels, Aaron M. Forster, Robert F. Cook
Indentation-induced phase transformation processes were studied by in situ Raman microspectroscopy of the deformed contact region of silicon on sapphire samples during contact loading and unloading. During loading, the formation of Si-II and another phase
James E. Maslar, William A. Kimes, Brent A. Sperling
An in situ gas-phase diagnostic for the metal alkylamide compound tetrakis(ethylmethylamino) hafnium (TEMAH), Hf[N(C2H5)(CH3)]4, was demonstrated. This diagnostic is based on direct absorption measurement of TEMAH vapor using an external cavity quantum
JMONSEL, an electron beam imaging simulator, has been modified to permit conducting regions of a sample to be designated as unconnected to an external source or sink of charge (floating) or, alternatively, to be connected with a user-specified relaxation
Rapid growth in nanomaterial applications highlight limitations of available physicochemical characterization methods. An in situ electrochemical small-angle neutron scattering (eSANS) meth-odology was devised that enables direct measurements of nano
This 2011 roadmap for radio frequency and analog/mixed-signal (RF and AMS) technologies presents the challenges, technology requirements, and potential solutions for the basic technology elements (transistors and passive devices). RF and AMS technologies
Radio frequency and analog/mixed-signal (RF and A/MS) technologies are essential and critical technologies for the rapidly diversifying semiconductor market that comprises many more applications than the wireless and wire-line communications market that
Micro-Electro-Mechanical Systems (MEMS) are devices that are fabricated using techniques similar to those used for integrated circuits (ICs) to create micrometer-sized mechanical structures (suspended bridges, cantilevers, membranes, fluid channels, etc.)
The International Technology Roadmap for Semiconductors (ITRS) Emerging Research Materials (ERM) and Emerging Research Devices (ERD) Technology Workgroups have identified materials and devices that could enable continued increases in the density and
Over the last decade, the world of semiconductors has broadened its horizon from More Moore and beyond conventional scaling to More than Moore. Some first hypothesized the end of Moores law and the beginning of a new era. They saw it as an OR gate while